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US 6,656,483 B1Granted
Cosmetic compositions containing polyurethane
AssigneeAvon Products, Inc.
InventorsAlan Farer, Christian J. Lee
Life of this patent
Estimating the term…
Abstract
There is provided a cosmetic composition, preferably in the form of a nail polish, comprising a primary film former, one or more high-molecular weight polyurethanes, and, optionally, one or more arylsulfonamide epoxy resins.
Claims21
A cosmetic composition comprising:
- a cellulose-based film forming agent;
- and
- a polyurethane resin having a molecular weight about 20,000 to about 80,000, wherein said polyurethane resin has a Tg of about −4° C. to about −20° C. and said composition further comprises an arylsulfonamide epoxy resin.
A cosmetic composition comprising:
- a cellulose-based film forming agent present in an amount about 5 wt % to about 15% by weight of the total weight of the composition;
- and
- a polyurethane resin having a molecular weight about 20,000 to about 80,000 and present in an amount about 2 wt % to about 15 wt % by weight of the total weight of the composition, wherein said polyurethane resin has a Tg of about −4° C. to about −20° C. and said composition comprises an arylsulfonamide epoxy resin that is tosylamide epoxy resin.
Dependencies are inferred from the claim text.