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US 6,656,398 B2Granted
Process of making a pattern in a film
AssigneeCorning Incorporated
InventorsWilliam R. Birch, Alain R. E. Carre, Paul D. Frayer, Kenjiro Hasui
Life of this patent
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Abstract
A method for forming a pattern in a film carried on a substrate includes depositing a layer of alkyl silane on a surface of a mold having a pattern, bringing the mold in contact with the film on the substrate and pressing the mold into the film so as to emboss the pattern on the mold in the film, wherein the film comprises a thermoplastic polymer, and removing the mold from the film.
Claims11
A method for forming a pattern in a film carried on a substrate, comprising:
- depositing a layer of alkyl silane on a surface of a mold having a pattern;
- bringing the mold in contact with the film on the substrate and pressing the mold into the film so as to emboss the pattern on the mold in the film, wherein the film comprises a thermoplastic polymer;
- and
- removing the mold from the film.
1 more element
Dependencies are inferred from the claim text.