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US 6,656,374 B2Granted
Post etch inspection system
AssigneeOrbotech Ltd.
InventorNissim Savareigo
Life of this patent
Estimating the term…
Abstract
Apparatus and method for post etching inspection of electrical circuits including an optical inspection assembly viewing an electrical circuit at various regions thereon and providing output indications of etching characteristics of the electrical circuit at the various regions and output circuitry receiving the output indications of etching characteristics of the electrical circuit at the various regions and providing an output indication of variations in the etching characteristics between at least some of the various regions.
Claims19
A method for post etching inspection of electrical circuits, comprising:
- viewing an electrical circuit at various locations thereon and providing output indications of a width of a conductor line on said electrical circuit at said various locations along a length of the conductor line;
- and
- receiving said output indications of said width of a conductor line on said electrical circuit at said various locations and providing an output indication of variations in an etching characteristic between at least some of said various locations, said etching characteristic corresponding to a line width of the conductor line being generally uniform at least over a minimum length of the conductor line.
Dependencies are inferred from the claim text.