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US 6,656,368 B2Granted
Nonstick layer for a micromechanical component
AssigneeRobert Bosch GmbH
InventorsMartin Schoefthaler, Peter Hein, Helmut Skapa, Horst Muenzel
Life of this patent
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Abstract
A method for manufacturing micromechanical components, and a micromechanical component, in which a movable element is produced on a sacrificial layer. In a subsequent step the sacrificial layer beneath the movable element is removed so that the movable element becomes movable. After removal of the sacrificial layer, a protective layer is deposited on a surface of the movable element. Silicon oxide and/or silicon nitride is used for the protective layer.
Claims7
A method for manufacturing a micromechanical component, comprising:
- producing, on a sacrificial layer, a movable element by patterning an upper layer;
- producing a metallization layer on the upper layer, wherein the metallization layer is not applied to the sacrificial layer;
- removing a portion of the sacrificial layer beneath the moveable element, so that the movable element becomes movable;
- subsequent to removing the portion of the sacrificial layer, producing a protective layer on the movable element and the metallization layer, wherein an adhesive force of the movable element is reduced by the protective layer;
- and
- removing the protective layer from the metallization layer.
3 more elements
Dependencies are inferred from the claim text.