US 6,656,323 B2Granted

Plasma processing apparatus

AssigneeTokyo Ohka Kogyo Co., Ltd.

InventorsKazuto Obuchi, Kaoru Mizutani

Life of this patent

Estimating the term…

Loading patent…

Abstract

For obtaining uniformity of processing by controlling difference in impedance between a plurality of processing chambers, in a plasma processing apparatus, a conductor 7 of an attachment portion 3a and a conductor 7 of an attachment portion 3c are connected via a small width portion 7a, and therefore belt-like electrodes 11 and 13 are equal to each other in electrical potential. That is, the belt-like electrode 11 and the belt-like electrode 13 constitute a first electrode. Furthermore, to each of the belt-like electrodes 11 and 11 is applied high frequency power from a single high-frequency electric power supply 17 through a cable 18, and the belt-like electrodes 13 and 13 are connected (or short-circuited) to each other by means of a belt-like conductor 19 having a width substantially equal to that of the belt-like electrode 13.

Claims7

Dependent claims

An apparatus for plasma processing, having a plurality of processing chambers in which plasma is generatable, said apparatus comprising:

a plurality of first belt-like electrodes provided on the outer periphery of each of said processing chambers;
and
a plurality of second belt-like electrodes provided on the outer periphery of each of said processing chambers, said first belt-like electrodes and each of said second belt-like electrodes being provided alternately and being separated vertically with respect to each other on each of said processing chambers;
wherein:
said first belt-like electrodes are adapted to be connected to a high-frequency electric power source, while said second belt-like electrodes are adapted to be connected either to the earth or to an electric power source lower in frequency than that of said high-frequency electric power source;
said first belt-like electrodes on each said processing chamber having a first portion adapted to be connected to the high frequency power source, and a second portion electrically connected to said first belt-like electrodes on another said processing chamber;
and
said first belt-like electrodes on all of said processing chambers are electrically connected to each other.

5 more elements

Dependencies are inferred from the claim text.