Semiconductor device manufacturing apparatus having rotatable gas injector and thin film deposition method using the same

A semiconductor device manufacturing apparatus comprising:

• a reaction chamber provided with a gas-exhausting outlet for exhausting an inner gas;
• a susceptor-supporting die horizontally arranged within the reaction chamber;
• at least one susceptor installed on the susceptor-supporting die, on which a wafer is mounted;
• a cylinder vertically coupled to an upper outer wall of the reaction chamber, the cylinder having a plurality of ring-shaped grooves formed along an inner wall thereof, each of the ring-shaped grooves being connected to a plurality of gas injection holes formed so as to penetrate a side wall of the cylinder;
• a rotational shaft closely contacted with the inner wall of the cylinder, rotatably inserted in the cylinder, vertically inserted within the reaction chamber, having multiple gas supply tubes arranged parallel to a length direction thereof, one end of each of the gas supply tubes communicating with the ring-shaped groove;
• and
• a propeller type gas injector having horizontally radially branched tubes connected with the gas supply tubes at an insertion end of the rotational shaft, the branched tubes each having multiple injection holes, the propeller type gas injector being horizontally rotated by a rotational movement of the rotational shaft.