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US 6,656,026 B2Granted
Wafer polishing apparatus
AssigneeTokyo Seimitsu Co., Ltd.
InventorMinoru Numoto
Life of this patent
Estimating the term…
Abstract
In the wafer polishing apparatus for pressing a wafer against a polishing pad with an air bag, which is provided to a carrier, pressing area regulating members are attached to the bottom face of the carrier, whereby areas for pressing the wafer with the air bag are regulated. The pressing area regulating members are prepared in order to regulate different areas to be pressed. The areas for pressing the wafer with the air bag can be changed by replacing the pressing area regulating members when suitable.
Claims5
A wafer polishing apparatus in which a wafer is pressed against a polishing pad so as to polish the wafer, comprising:
- a carrier;
- air spout openings provided to a bottom of said carrier, said air spout openings spouting air so as to form an air layer between said carrier and said wafer in order to press the wafer against the polishing pad by the air layer to polish the wafer;
- air bags provided to the bottom of said carrier for forming said air layer and for partially pressing a top face of said wafer;
- and
- pressing area regulating members which are detachably attached to the bottom of said carrier for regulating an area where said air bag presses the top face of said wafer,
- wherein said pressing area regulating members regulate different areas to be pressed, and said pressing area regulating members can be replaced so that an area for pressing said wafer with said air bag is changed.
3 more elements
Dependencies are inferred from the claim text.