Vacuum processing apparatus and operating method therefor
AssigneeHitachi, Ltd.
InventorsShigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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AssigneeHitachi, Ltd.
InventorsShigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
Estimating the term…
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
A conveyor system for use in a vacuum processing apparatus, comprising;
A conveyor system for use in a vacuum processing apparatus, comprising:
Apparatus for a carrying out a method including the steps of:
A vacuum processing apparatus, comprising:
A vacuum processing apparatus, comprising:
A vacuum processing apparatus, comprising:
A vacuum processing apparatus, comprising:
A vacuum processing apparatus, comprising:
A vacuum processing apparatus, comprising:
A method for vacuum processing substrates in a vacuum processing apparatus having a plurality of vacuum processing chambers for processing said substrates, the vacuum processing apparatus comprising:
A vacuum processing apparatus, comprising:
A method for vacuum processing substrates in a vacuum processing apparatus having a plurality of vacuum processing chambers for processing said substrates, the vacuum processing apparatus comprising:
Dependencies are inferred from the claim text.