Doped semiconductor material, a method of manufacturing the doped semiconductor material, and a semiconductor device
AssigneeSharp Kabushiki Kaisha
InventorsAlistair Henderson Kean, Haruhisa Takiguchi
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Abstract
A semiconductor layer is co-doped with two dopants. The first dopant is to generate charge carriers in the semiconductor material, and the second dopant is to promote atomic disorder within the material. When the semiconductor material is annealed, the second dopant becomes mobile and moves through the lattice so as to promote atomic disorder. This eliminates unwanted effects such as, for example, a reduction in the forbidden bandgap that can otherwise arise as a result of atomic ordering. The amount of diffusion of the second dopant during the annealing can be increased by making the initial concentration of the second dopant non-uniform over the volume of the semiconductor material.
Claims13
A method of fabricating a semiconductor material, comprising the steps of introducing first and second dopants into the semiconductor material during the growth of the semiconductor material, the first dopant being for providing charge carriers, and the second dopant being for promoting atomic disorder within the semiconductor material.
Dependencies are inferred from the claim text.