System configured for applying multiple modifying agents to a substrate

A system configured for applying multiple modifying agents to a continuous substrate, substantially isolated from a surrounding atmosphere comprising;

• a first processing chamber configured for applying a first modifying agent to the continuous substrate and a second processing chamber configured for applying a second modifying agent to said continuous substrate after the first modifying agent is applied to said continuous substrate, where at least one processing chamber of the first processing chamber and the second processing chamber is fluidly coupled to a corresponding collection chamber configured for removing unused modifying agent from the at least one processing chamber;
• a first end seal disposed adjacent to the first processing chamber configured for substantially isolating fluids present in the first processing chamber from the surrounding atmosphere;
• a second end seal disposed adjacents to the second processing chamber configured for substantially isolating fluids present in the second processing chamber from the surrounding atmosphere;
• a first interstitial seal disposed between the first processing chamber and the second processing chamber, configured for keeping fluids present in each of said processing chambers substantially separate;
• and
• a passageway configured for allowing continuous passage of the continuous substrate through the first end seal, the first processing chamber, the second processing chamber, and the second end seal in series.

A system configured for applying multiple modifying agents to a continuous substrate, substantially isolated from a surrounding atmosphere comprising:

• a first processing chamber configured for applying a first modifying agent to the continuous substrate;
• a second processing chamber for applying a second modifying agent to said continuous substrate after the first modifying agent is applied to said continuous substrate;
• a first end seal disposed adjacent to the second processing chamber and the second processing isolating fluids present in the first processing chamber from the surrounding atmosphere;
• a second end seal disposed adjacent to the second processing chamber configured for substantially isolating fluids present in the second processing chamber from the substantially separate;
• a first interstitial seal disposed between the first processing chamber and the second processing chamber, configured for keeping fluids present in each of said processing chambers substantially separate;
• a collection chamber configured for collecting a carrier and any unused modifying agent from at least one processing chamber of the first processing chamber and the second processing chamber, wherein the at least one processing chamber is configured to utilize a treatment mixture comprising the modifying agent and the carrier, wherein the carrier is selected from the group consisting of supercritical fluid, near-critical fluid, superheated fluid, superheated liquid, and liquefied gas;
• and
• a passageway configured for allowing continuous passage of the continuous substrate through the first end seal, the first processing chamber, the second processing chamber, and the second end seal in series.

A device configured for applying multiple modifying agents to a continuous substrate while substantially isolating the continuous substrate from a surrounding atmosphere, comprising:

• a passageway configured for continuous passing a substrate through the system;
• a first processing chamber configured for applying a first modifying agent to the continuous substrate;
• a second processing chamber configured for applying a second modifying agent to said continuous substrate after the first modifying agent is applied to said continuous substrate;
• at least one processing chamber of said first processing chamber and said second processing chamber comprising a first region, a second region, and a constricted medial region between said first region and said second region, said at least one processing chamber being further configured to accept a treatment mixture into said constricted region of said passageway during continuous movement of said continuous substrate through said passageway within said at least one processing chamber, said treatment mixture comprising the modifying agent in a carrier medium, said carrier medium being selected from the group consisting of a supercritical fluid, a near-critical fluid, a superheated fluid, a superheated liquid, and liquified gas, such that said modifying agent separated from said constricted region upon a pressure drop when said treatment mixture is introduced into continuous substrate;
• at least one injector for each of the first and second processing chambers for injecting the first and second modifying agents into the first and second processing chambers, respectively, such that each modifying agent modifies the substrate continuously;
• a first interstitial seal disposed between the first processing chamber and the second processing chamber, configured for keeping fluids present in each processing chamber substantially separate;
• a first end seal positioned adjacent to the first processing chamber configured for substantially isolating fluids present in the first processing chamber from the surrounding atmosphere;
• a second end seal positioned adjacent to the second processing chamber configured for substantially isolating fluids present in the second processing chamber from the surrounding atmosphere;
• at least one expansion chamber disposed between each processing chamber and its adjacent end seals and interstitial seal.