Insulated-gate semiconductor device for a rectifier
AssigneeYamatake Corporation
InventorsIkuo Nishimoto, Tatsuya Ueno
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AssigneeYamatake Corporation
InventorsIkuo Nishimoto, Tatsuya Ueno
Estimating the term…
An insulated-gate semiconductor device comprises a source region (S) formed on a predetermined semiconductor substrate such as a ball semiconductor, a drain region (D) formed on the semiconductor substrate at a distance from the source region; and a gate electrode (G) formed on the semiconductor substrate with an insulating layer interposed therebetween to create a channel region between the source and drain regions. The insulated-gate semiconductor device is characterized in that the drain region and the source region are formed asymmetrically with respect to the channel region suited to be incorporated in a rectifier circuit for full-wave rectification of power supplied through inductive coupling of coils. In particular, the channel region is formed to surround the source region while the drain region is formed outside the channel region so that the effective channel width adjoining the source region may be different from that adjoining the drain region.
An insulated-gate semiconductor device for a rectifier circuit, comprising:
An insulated-gate semiconductor device for a rectifier circuit, comprising:
An insulated-gate semiconductor device for a rectifier circuit, comprising:
Dependencies are inferred from the claim text.