Method for manufacturing semiconductor device using group III nitride compound
AssigneeToyoda Gosei Co., Ltd.
InventorToshiya Uemura
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Abstract
A flip-chip-type device is formed from a plurality of flip-chip semiconductor device units integrated together on a common substrate having a Group III nitride compound semiconductor layer. A sealing resin is laminated on a surface of the common substrate cured, and the substrate is then divided into individual sealed flip-chip semiconductor devices. Because the positive and negative electrodes are formed on the same side of the devices, the sealing resin need only be applied to the side of the substrate on which the electrodes are formed. Metal pillars may be formed on the electrodes and extend through the cured resin to electrically connect the flip-type semiconductor device to an external source and produce a self-contained package.
Claims11
A sealed semiconductor device comprising:
- a semiconductor device unit having a Group III nitride compound semiconductor layer provided on a substrate, said semiconductor device unit comprising a positive electrode and a negative electrode;
- metal pillars formed on said positive electrode and said negative electrode;
- and
- a curable sealing resin laminated on a surface of said substrate on which said electrodes and metal pillars are formed so as to seal said electrodes and seal the metal pillars, said curable sealing resin having substantially the same height as said metal pillars,
- wherein the curable sealing resin has cut surfaces, each cut surface being located at an edge of the semiconductor device.
A sealed semiconductor device comprising:
- a semiconductor device unit having a Group III nitride compound semiconductor layer provided on a substrate, said semiconductor device unit comprising a positive electrode and a negative electrode;
- a first metal pillar formed on said positive electrode and a second metal pillar formed on said negative electrode;
- and
- a curable sealing resin laminated on a surface of said substrate on which said electrodes and metal pillars are formed so as to seal said positive and negative electrodes and the metal pillars, except for leaving exposed electrical connection portions of said first and second metal pillars, said curable sealing resin having substantially the same height as said metal pillars;
- and
- an external member electrically connected to the exposed electrical connection portions formed on said positive and negative electrodes;
- wherein the curable sealing resin has cut surfaces, each cut surface being located at an edge of the semiconductor device.
A sealed semiconductor device comprising:
- a semiconductor device unit having a Group III nitride compound semiconductor layer provided on a substrate, said semiconductor device unit comprising a positive electrode and a negative electrode;
- bonding pads formed on respective electrodes;
- a curable sealing resin laminated on a surface of said substrate on which said electrodes and bonding pads are formed so as to seal the electrodes and seal said bonding pads, said curable sealing resin having substantially the same height as said bonding pads, wherein the curable sealing resin has cut surfaces, each cut surface being located at an edge of the semiconductor device.
Dependencies are inferred from the claim text.