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US 6,649,885 B2Granted
Thermal processing apparatus
AssigneeSumitomo Mitsubishi Silicon Corporation
InventorsYoshiaki Nakagawa, Shizuka Tateishi
Life of this patent
Estimating the term…
Abstract
It is difficult to keep a wafer at a prescribed temperature in epitaxial growth and etching, leading to a possibility of variations in quality, but a thermal processing apparatus according to the present invention has a learning-modifying means in a controlling means to learn and modify an output s1 from a radiation thermometer based on the output s1 from the radiation thermometer, a supplied electric energy P to a heating means, and an output s2 from a radiation thermometer.
Claims12
A thermal processing apparatus, comprising:
- a heating means;
- a power supply means to supply electric power to said heating means;
- a controlling means to control supplied electric energy to said heating means;
- and
- a first temperature measuring means to measure the temperature of a workpiece through a member which transmits infrared rays, said first temperature measuring means having an output corresponding to a measured temperature of the workpiece;
- wherein said controlling means comprises a learning-modifying means for learning the output from said first temperature measuring means and modifying the output from said first temperature measuring means to more accurately correspond to the actual temperature of the workpiece based on at least one of the output from said first temperature measuring means, a supplied electric energy to said heating means and an output from a second temperature measuring means separate from said first temperature measuring means.
3 more elements
A thermal processing apparatus, comprising:
- a heating means;
- a power supply means to supply electric power to said heating means;
- a controlling means to control supplied electric energy to said heating means;
- and
- a first temperature measuring means to measure the temperature of a workpiece through a member which transmits infrared rays, said first temperature measuring means having an output corresponding to a measured temperature of the workpiece;
- wherein said controlling means comprises a rotational component eliminating means for controlling by eliminating a periodically fluctuating signal component which appears in the output from said first temperature measuring means with rotation of the workpiece.
3 more elements
A thermal processing apparatus, comprising:
- a heating means;
- a power supply means to supply electric power to said heating means;
- a controlling means to control supplied electric energy to said heating means;
- and
- a first temperature measuring means to measure the temperature of a workpiece through a member which transmits infrared rays, said first temperature measuring means having an output corresponding to a measured temperature of the workpiece;
- wherein said controlling means comprises both a learning-modifying means for learning the output from said first temperature measuring means and modifying the output from said first temperature measuring means to more accurately correspond to the actual temperature of the workpiece based on at least one of the output from said first temperature measuring means, a supplied electric energy to said heating means and an output from a second temperature measuring means separate from said first temperature measuring means, and a rotational component eliminating means for controlling by eliminating a periodically fluctuating signal component which appears in the output from said first temperature measuring means with rotation of the workpiece.
3 more elements
A thermal processing apparatus, comprising:
- a member which transmits infrared rays;
- a heating system for heating a workpiece to be processed;
- a power supply to supply electric power to said heating system;
- a first radiation thermometer to measure the temperature of the workpiece through said member which transmits infrared rays;
- and
- a controlling means for controlling electric energy supplied to said heating system by said power supply, said controlling means comprising at least one of:
- a learning-modifying means for learning the output from said first radiation thermometer and modifying the output from said first radiation thermometer to more accurately correspond to the actual temperature of the workpiece based on at least one of the output from said first radiation thermometer, the electric energy supplied to said heating system and an output from a second radiation thermometer separate from said first radiation thermometer, and
- a rotational component eliminating means for controlling by eliminating a periodically fluctuating signal component which appears in the output from said first temperature measuring means with rotation of the workpiece.
5 more elements
Dependencies are inferred from the claim text.