Aliphatic polyester film and gas barrier film
AssigneeToyo Boseki Kabushiki Kaisha
InventorsHisato Kobayashi, Keiji Mori, Naonobu Oda, Tadashi Okudaira
Life of this patent
Estimating the term…
Abstract
A film of the present invention includes, as its main component, an aliphatic polyester whose primary repeating unit is represented by a general formula —O—CHR—CO— (where R denotes H or an alkyl group having a carbon number of 1-3). A three-dimensional surface roughness SRa of at least one side of the film is about 0.01 μm to about 0.1 μm. PCC value denoting the number of projections on the film per a unit of area along a mean roughness plane and the three-dimensional surface roughness SRa satisfy the following relationship: PCC value≦7000-45000×SRa.
Claims4
A gas barrier film, comprising a resin layer and a vapor-deposited layer which is applied on at least one side of the resin layer, wherein:
- the resin layer comprises, as its main component, an aliphatic polyester whose primary repeating unit is represented by a general formula —O—CHR—CO— (where R denotes H or an alkyl group having a carbon number of 1-3);
- the vapor-deposited layer is selected from the group consisting of an aluminum oxide/silicon oxide-based vapor-deposited layer, an aluminum oxide-based vapor-deposited layer and a silicon oxide-based vapor-deposited layer;
- a content of aluminum oxide in the aluminum oxide/silicon oxide-based vapor-deposited layer is about 20 wt % to about 99 wt %;
- a “b” value, which is calculated according to the following expression (1) based on a specific gravity D of the vapor-deposited layer and the aluminum oxide content A in wt % in the vapor-deposited layer, satisfies the following expression (2):
- Expression (1):
- b=D−0.01A
- Expression (2):
- 1.6≦b≦2.2
- (where D denotes the specific gravity of the vapor-deposited layer, and A denotes the aluminum oxide content in wt % in the vapor-deposited layer);
- a specific gravity of the aluminum oxide-based vapor-deposited layer is about 2.70 to about 3.30;
- and
- a specific gravity of the silicon oxide-based vapor-deposited layer is about 1.80 to about 2.20.
Dependencies are inferred from the claim text.