Photo-assisted remote plasma apparatus and method
AssigneeMicron Technology, Inc.
InventorVishnu K. Agarwal
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Abstract
The present invention provides a plasma processing system comprising a remote plasma activation region for formation of active gas species, a transparent transfer tube coupled between the remote activation region and a semiconductor processing chamber, and a source of photo energy for maintaining activation of the active species during transfer from the remote plasma activation region to the processing chamber. The source of photo energy preferably includes an array of UV lamps. Additional UV lamps may also be used to further sustain active species and assist plasma processes by providing additional in-situ energy through a transparent window of the processing chamber. The system can be utilized for annealing.
Claims5
An apparatus for carrying out remote plasma-enhanced annealing of a dielectric material of a semiconductor substrate, comprising:
- a substrate processing chamber;
- a substrate support chuck within said processing chamber;
- a remote plasma activation region;
- a conduit connecting said remote plasma activation region to said processing chamber, said conduit being at least partially transparent;
- a photo energy source to maintain the activated state of a plasma gas activated in said remote plasma activation region by providing photo energy to said plasma gas while within said conduit;
- and
- an energy source at said processing chamber, said energy source providing energy to anneal said dielectric material of said semiconductor substrate.
Dependencies are inferred from the claim text.