Method for fabricating a III nitride film, and underlayer for fabricating a III nitride film and a method for fabricating the same underlayer
AssigneeNGK Insulators, Ltd.
InventorsKeiichiro Asai, Tomohiko Shibata, Yukinori Nakamura, Mitsuhiro Tanaka
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Abstract
A method for fabricating a Group III nitride film is provided, including the steps of preparing a substrate, forming an underfilm and then forming the Group III nitride film on the underfilm. The underfilm is a Group III nitride comprising at least one Group III element and includes at least 50 atomic percent of elemental Al with respect to all of the Group III elements of the Group III nitride of the underfilm. The surface of the underfilm is contoured (concave-convex) and includes flat regions, and less than 50% of the underfilm surface is occupied by the flat regions.
Claims11
A method for fabricating a Group III nitride film, comprising the steps of:
- preparing a substrate, having a main surface;
- forming an underfilm having contoured surface structure including flat regions, wherein 50% or less of said contoured surface structure is occupied by said flat regions, said underfilm comprising a first Group III nitride comprising at least one Group III element and including at least 50 atomic percentage of elemental Al with respect to all of the Group III elements constituting said first Group III nitride;
- and
- forming another Group III nitride film on said underfilm.
A method for fabricating an underfilm having a contoured surface structure including flat regions, wherein 50% or less of said contoured surface structure is occupied by said flat regions, comprising the steps of:
- preparing a substrate;
- supplying a Group V raw material gas and a Group III raw material gas onto said substrate at a flow ratio (Group V raw material gas/Group III raw material gas) of 600 or below, to epitaxially form, a first film on said substrate, said first film comprising a first Group III nitride comprising at least one Group III element and including at least 50 atomic percentage of elemental Al with respect to all of the Group III elements of said first film;
- and
- supplying said Group V raw material gas and said Group III raw material gas onto said substrate at a flow ratio (Group V raw material gas/Group III raw material gas) of more than 600, to epitaxially form, a second film made on said first film, said second film comprising another Group III nitride comprising at least one Group III element and including at least 50 atomic percentage of elemental Al with respect to all of the Group III elements of said second film.
A method for fabricating an underfilm having a contoured surface structure including flat regions, wherein 50% or less of said contoured surface structure is occupied by said flat regions, comprising the steps of:
- preparing a substrate;
- supplying a Group V raw material gas and a Group III raw material gas onto said substrate under a pressure of 20 Torr or below, to epitaxially form, a first film on said substrate, said first film comprising a first Group III nitride comprising at least one Group III element and including at least 50 atomic percentage elemental Al with respect to all of the Group III elements of said first film;
- and
- supplying said Group V raw material gas and said Group, III raw material gas onto said substrate under a pressure of more than 20 Torr, to epitaxially form, a second film on said first film, said second film comprising another Group III nitride comprising at least one Group III element and including at least 50 atomic percentage of elemental Al with respect to all of the Group III elements of said second film.
A method for fabricating an underfilm having a contoured surface structure including flat regions, wherein 50% or less of said contoured surface structure is occupied by said flat regions comprising the steps of:
- preparing a substrate;
- heating said substrate to a temperature of at least 1100° C.;
- supplying a Group V raw material gas and a Group III raw material gas onto said substrate to epitaxially form a first film on said substrate, said first film comprising a first Group III nitride comprising at least one Group III element and including at least 50 atomic percentage of elemental Al with respect to all of the Group III elements of said first film;
- cooling said substrate to a temperature below 1100° C.;
- and
- supplying said Group V raw material gas and said Group III raw material gas onto said substrate, to epitaxially form a second film on said first film, said second film comprising another Group III nitride comprising at least one Group III element and including at least 50 atomic percentage of elemental Al with respect to all of the Group III elements of said second film.
Dependencies are inferred from the claim text.