Back to results
US 6,649,310 B2Granted
Method of manufacturing photomask
AssigneeKabushiki Kaisha Toshiba
InventorsMasamitsu Itoh, Shigeki Nojima, Shoji Mimotogi, Osamu Ikenaga
Life of this patent
Estimating the term…
Abstract
A method of manufacturing a photomask includes determining an average value of dimensions of a pattern in a photomask. determining an in-plane uniformity of the dimensions, determining an exposure latitude on the basis of the average value and the in-plane uniformity. The exposure latitude depends on dimensional accuracy of the pattern. Judging if the photomask is defective or non-defective is made on the basis of whether or not the exposure latitude falls within a prescribed exposure latitude
Claims60
A method of manufacturing a photomask comprising:
- determining an average value of dimensions of a pattern of the photomask;
- determining an in-plane uniformity of the dimensions;
- determining an exposure latitude on the basis of the average value and the in-plane uniformity;
- and
- judging if the photomask is defective or non-defective on the basis of whether or not the exposure latitude falls within a prescribed exposure latitude.
2 more elements
A method of manufacturing a half-tone phase-shifting mask comprising:
- determining an average value of dimensions of a half-tone pattern of the half-tone phase-shifting mask;
- determining an in-plane uniformity of the dimensions;
- determining an average value of transmittance of the half-tone pattern;
- determining an In-plane uniformity of the transmittance;
- determining an average value of magnitude of phase-shift of the half-tone pattern;
- determining an in-plane uniformity of the magnitude of phase-shift;
- determining an exposure latitude on the basis of the average value and the in-plane uniformity in the dimensions, the average value and the in-plane uniformity in the transmittance, and the average value and the in-plane uniformity of the magnitude of phase-shift;
- and
- judging if the half-tone phase-shifting mask is defective or non-defective on the basis of whether or not the exposure latitude falls within a prescribed exposure latitude.
6 more elements
A method of manufacturing an alternating phase-shifting mask comprising:
- determining an average value of dimensions of a pattern of the alternating phase-shifting mask;
- determining an in-plane uniformity of the dimensions;
- determining an average value of magnitude of phase-shift of a light-transmitting region in the alternating phase-shifting mask;
- determining an in-plane uniformity of the magnitude of phase-shift;
- determining an exposure latitude on the basis of the average value and the in-plane uniformity in the dimensions, and the average value and the in-plane uniformity of the magnitude of phase-shift;
- and
- judging if the alternating phase-shifting mask is defective or non-defective on the basis of whether or not the exposure latitude falls within a prescribed exposure latitude.
4 more elements
A method of manufacturing a photomask comprising:
- obtaining in advance a relationship between:
- an average value of dimensions of a pattern and
- an in-plane uniformity of the dimensions,
- the relationship satisfying a prescribed exposure latitude;
- determining an average value of dimensions of a pattern of the photomask;
- determining an in-plane uniformity of the dimensions;
- and
- judging if the photomask is defective or non-defective on the basis of whether or not the average value determined and the in-plane uniformity determined satisfy the relationship obtained in advance.
5 more elements
A method of manufacturing a half-tone phase-shifting mask comprising:
- obtaining in advance a relationship among
- an average value of dimensions of a half-tone pattern,
- an in-plane uniformity of the dimensions,
- an average value of transmittance of the half-tone pattern,
- an in-plane uniformity of the transmittance,
- an average value of magnitude of phase-shift of the half-tone pattern, and
- an in-plane uniformity of the magnitude of phase-shift,
- wherein the relationship satisfies a prescribed exposure latitude;
- determining an average value of dimensions of a half-tone pattern of the half-tone phase-shifting mask;
- determining an in-plane uniformity of the dimensions;
- determining an average value of transmittance of the half-tone pattern;
- determining an in-plane uniformity of the transmittance;
- determining an average value of magnitude of phase-shift of the half-tone pattern;
- determining an in-plane uniformity of the magnitude of phase-shift;
- and
- judging if the half-tone phase-shifting mask is defective or non-defective on the basis of whether or not the average value of the dimensions determined, the in-plane uniformity of the dimensions determined, the average value of the transmittance determined, the in-plane uniformity of the transmittance determined, the average value of the magnitude of phase-shift determined, and the in-plane uniformity of the magnitude of phase-shift determined satisfy the relationship obtained in advance.
13 more elements
A method of manufacturing an alternating phase-shifting mask comprising:
- obtaining in advance a relationship among:
- an average value of dimensions of a pattern,
- an in-plane uniformity of the dimensions,
- an average value of magnitude of phase-shift of a light-transmitting region, and
- an in-plane uniformity of the magnitude of phase-shift,
- wherein the relationship satisfies a prescribed exposure latitude;
- determining an average value of dimensions of a pattern of the alternating phase-shifting mask;
- determining an in-plane uniformity of the dimensions;
- determining an average value of magnitude of phase-shift of a light-transmitting region in the alternating phase-shifting mask;
- determining an in-plane uniformity of the magnitude of phase-shift;
- and
- judging if the alternating phase-shifting mask is defective or non-defective on the basis of whether or not the average value of the dimensions determined, the in-plane uniformity of the dimensions determined, the average value of the magnitude of phase-shift determined, and the in-plane uniformity of the magnitude of phase-shift determined satisfy the relationship obtained in advance.
9 more elements
A method of manufacturing a photomask comprising:
- determining an average value of dimensions of a pattern in a photomask;
- determining an in-plane uniformity of the dimensions;
- determining a locational accuracy of the pattern;
- determining an exposure latitude 1 on the basis of the average value and the in-plane uniformity of the dimensions;
- determining an exposure latitude 2 on the basis of the locational accuracy;
- determining a totality exposure latitude on the basis of the exposure latitude 1 and the exposure latitude 2;
- and
- judging if the photomask is defective or non-defective on the basis of whether or not the totality exposure latitude falls within a prescribed exposure latitude.
5 more elements
A method of manufacturing a phase-shifting mask comprising:
- determining an average value of dimensions of a pattern in a phase-shifting mask;
- determining an in-plane uniformity of the dimensions;
- determining a locational accuracy of the pattern;
- determining optical properties of a phase-shifter in the phase-shifting mask;
- determining an exposure latitude 1 on the basis the average value and the in-plane uniformity of the dimensions;
- determining an exposure latitude 2 on the basis of the locational accuracy;
- determining an exposure latitude 3 on the basis of the optical properties;
- determining a totality exposure latitude on the basis of the exposure latitude 1, the exposure latitude 2, and the exposure latitude 3;
- and
- judging if the phase-shifting mask is defective or non-defective on the basis of whether or not the totality exposure latitude falls within a prescribed exposure latitude.
7 more elements
A method of manufacturing a half-tone phase-shifting mask comprising:
- determining an average value of dimensions of a half-tone pattern in a half-tone phase-shifting mask;
- determining an in-plane uniformity of the dimensions;
- determining an average value of transmittance of the half-tone pattern;
- determining an in-plane uniformity of the transmittance;
- determining an average value of magnitude of phase-shift of the half-tone pattern;
- determining an in-plane uniformity of the magnitude of phase-shift;
- determining a first exposure latitude on the basis of the average value and the in-plane uniformity of the dimensions;
- determining a second exposure latitude on the basis of the average value of the transmittance, the in-plane uniformity of the transmittance, the average value of the magnitude of phase-shift, and the in-plane uniformity of the magnitude of phase-shift;
- determining a totality exposure latitude on the basis of the first and second exposure latitudes;
- and
- judging if the half-tone phase-shifting mask is defective or non-defective on the basis of whether or not the totality exposure latitude falls within a prescribed exposure latitude.
8 more elements
A method of manufacturing an alternating phase-shifting mask comprising:
- determining an average value of dimensions of a pattern in an alternating phase-shifting mask;
- determining an in-plane uniformity of the dimensions;
- determining an average value of magnitude of phase-shift of a light-transmitting region in the alternating phase-shifting mask;
- determining an in-plane uniformity of the magnitude of phase-shift;
- determining a first exposure latitude on the basis of the average value and the in-plane uniformity of the dimensions;
- determining a second exposure latitude on the basis of the average value and the in-plane uniformity of the magnitude of phase-shift;
- determining a totality exposure latitude on the basis of the first and second exposure latitudes;
- and
- judging if the alternating phase-shifting mask is defective or non-defective on the basis of whether or not the totality exposure latitude falls within a prescribed exposure latitude.
6 more elements
Dependencies are inferred from the claim text.