Method and apparatus for inductively coupled plasma treatment
AssigneeEuropean Community (EC)
InventorsPascal Colpo, François Rossi
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Abstract
The apparatus for plasma treatment of a non-conductive hollow substrate (5), comprises a plasma chamber (12) provided with two oppositely facing field admission windows (8, 9), and first and second opposite coil arrangements (20, 30) located on an outer surface (8a; 9a) of the first and second windows respectively. The first and second coil arrangements being connected to power supply means (4) such that a current (I) of a same direction flows simultaneously in the first and second coil arrangements. The two coil arrangements (20, 30) induce through the substrate a magnetic flux (7) transversal and perpendicular to a substrate depth (L) for generating an electrical field in the substrate plan.
Claims17
Method for plasma treatment of a hollow substrate (5) made of a non-conductive material in which a plasma is generated from a process gas (15) inside the substrate, said plasma generation comprising the step of producing through the substrate a magnetic field (7) substantially perpendicular to a direction of a substrate depth (L).
Apparatus for plasma treatment of a non-conductive hollow substrate (5), comprising generation means for generating a plasma in the substrate, said generation means comprises electromagnetic means (20, 30) for producing through the substrate a magnetic flux (7) perpendicular to a direction of a substrate depth (L).
Dependencies are inferred from the claim text.