Process for producing a purified aqueous hydrogen peroxide solution
AssigneeSantoku Chemical Industries Co., Ltd.
InventorsFujio Tanaka, Takashi Adachi, Kazuhisa Mine, Kazuya Kimura
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Abstract
A process for producing a highly purified aqueous hydrogen peroxide solution by removing silicon oxide impurities from an aqueous hydrogen peroxide solution containing silicon oxide impurities by adding a flocculating agent and filtering out impurities of solid content contained in the aqueous hydrogen peroxide solution with a precision filter, thereafter bringing the aqueous hydrogen peroxide solution into contact with an anion exchange resin in a fluoride ion form by at least one fluoride compound which contains 0.05% by weight or less of SiF6 and is selected from the group consisting of sodium fluoride, potassium fluoride and ammonium fluoride.
Claims15
A process for producing a purified aqueous hydrogen peroxide solution by removing silicon oxide impurities contained in an aqueous hydrogen peroxide solution, which comprises:
- adding a flocculating agent to an aqueous hydrogen peroxide solution containing silicon oxide impurities, and filtering out impurities of solid content contained in the aqueous hydrogen peroxide solution with a precision filter, thereafter
- bringing the aqueous hydrogen peroxide solution obtained as above into contact with an anion exchange resin in a fluoride ion form changed by at least one fluoride compound which contains 0.05% by weight or less of SiF6 and is selected from the group consisting of sodium fluoride, potassium fluoride and ammonium fluoride,
- wherein the flocculating agent is a phosphorus compound, and the phosphorus compound is added in an amount that the atomic ratio (Si/P) of silicon oxide impurities contained in the aqueous hydrogen peroxide solution in terms of silicon atom to phosphorus compound in terms of phosphorus atom is 0.0001 or less.
A process for producing a purified aqueous hydrogen peroxide solution by removing silicon oxide impurities contained in an aqueous hydrogen peroxide solution, which comprises:
- adding a flocculating agent to an aqueous hydrogen peroxide solution containing silicon oxide impurities, and filtering out impurities of solid content contained in the aqueous hydrogen peroxide solution with a precision filter, thereafter bringing the obtained aqueous hydrogen peroxide solution into contact with;
- (i) a cation exchange resin in H+ form, then
- (ii) an anion exchange resin in the fluoride ion form changed by at least one fluoride compound which contains 0.05% by weight or less of SiF6 and is selected from the group consisting of sodium fluoride, potassium fluoride and ammonium fluoride, then
- (iii) an anion exchange resin in the carbonate ion form or bicarbonate form, thereafter
- (iv) a cation exchange resin in H+ forms
- wherein the flocculating agent is a phosphorus compound, and the phosphorus compound is added in an amount that the atomic ratio (Si/P) of silicon oxide impurities contained in the aqueous hydrogen peroxide solution in terms of silicon atom to phosphorus compound in terms of phosphorus atom is 0.0001 or less.
Dependencies are inferred from the claim text.