Method for utilizing sulfuric acid/peroxide liquid mixture
AssigneeSony Corporation
InventorYasuhito Inagaki
Life of this patent
Estimating the term…
Abstract
A technique of utilizing a sulfuric acid/peroxide liquid mixture, for example, its waste liquid material, is to be developed so that the waste liquid can be re-utilized and effectively applied to obviate the problem resulting from disposal. To this end, there is provided a method for utilizing a sulfuric acid/peroxide liquid mixture, for example, its waste liquid, in which peroxide in the sulfuric acid/peroxide liquid mixture is decomposed to render it possible to utilize the liquid mixture as sulfuric acid.
Claims7
A method for reusing sulfuric acid contained in a waste liquid mixture comprising sulfuric acid and peroxide, the waste liquid mixture being generated in a semiconductor manufacturing process, the method comprising:
- collecting the waste liquid mixture;
- decomposing the peroxide of the waste liquid mixture by adding an accelerator comprising nitrogen dioxide to the waste liquid mixture to produce a second liquid mixture comprising sulfuric acid;
- recovering the second liquid mixture;
- and
- using the second liquid mixture to modify a resin by treating the resin with the second liquid mixture, thereby reusing the sulfuric acid contained therein.
Dependencies are inferred from the claim text.