Mirrortron sputtering apparatus
AssigneeToyoaki Hirata
InventorsToyoaki Hirata, Masahiko Naoe
Life of this patent
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Abstract
A mirrortron sputtering apparatus for sputtering on a substrate includes a vacuum chamber for placing therein a pair of targets spaced apart from each other with inner surfaces thereof facing each other and outer surfaces thereof positioned opposite to the inner surfaces, and magnets respectively disposed closer to the outer surfaces of the targets for forming a magnetic field between said pair of targets. The magnetic field has a magnetic field distribution with a peripheral region having a high magnetic flux density and a center region having a low magnetic flux density. In this arrangement, the substrate is set alongside a space between the pair of targets as facing said magnetic field.
Claims26
A mirrortron sputtering apparatus, for sputtering on a substrate comprising:
- a vacuum chamber for placing therein a pair of targets spaced apart from each other with inner surfaces thereof facing each other and outer surfaces thereof positioned opposite to the inner surfaces:
- first and second groups of rare earth magnets respectively disposed closer to the outer surfaces of the targets for forming a magnetic field between said pair of targets, in which each of said first and second groups of rare earth magnets respectively comprises four rare earth magnets which are arranged in a rectangular shape with a first pair of opposed magnets and a second pair of opposed magnets, thereby forming a rectangular-column shape:
- said magnetic field having a magnetic field distribution with a peripheral region having a higher magnetic flux density than a magnetic flux density of a center region between one of the pair of targets and an interface of the pair of targets and between another of the pair of targets and said interface wherein when viewed in a three dimensional manner said peripheral region having the higher magnetic flux density than the magnetic flux density of said center region exists in a ring shape while said center region exists within said peripheral region to be surrounded by the same;
- and
- wherein said substrate is set alongside a space between the pair of targets as facing said magnetic field.
A mirrortron sputtering apparatus for sputtering on a substrate comprising:
- a vacuum chamber for placing therein a pair of targets:
- a pair of target holders disposed opposite to each other with a space therebetween for respectively holding said pair of targets in position with inner surfaces of the targets facing each other and outer surfaces thereof positioned opposite to the inner surfaces;
- first and second groups of rare earth magnets respectively mourned closer to the outer surfaces of the targets on said pair of target holders for forming a magnetic field between said targets, in which each of said first and second groups of rare earth magnets respectively comprises four rare earth magnets which are arranged in a rectangular shape with a first pair of opposed magnets and a second pair of opposed magnets thereby forming rectangular-column shape;
- said magnetic field having a magnetic field distribution with a peripheral region having magnetic flux density than a magnetic flux density of a center region between one of the pair of targets and said interface wherein when viewed in a three dimensional manner said peripheral region having the higher magnetic flux density than the magnetic flux density of said center region exists in a ring shape while said center region exists within said peripheral region to be surrounded by the same;
- and
- wherein said substrate is set alongside a space between the pair of targets as facing said magnetic field.
Dependencies are inferred from the claim text.