Apparatus for conditioning the atmosphere in a vacuum chamber
AssigneeAlcatel
InventorsRoland Bernard, Eric Chevalier, Gloria Sogan
Life of this patent
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Abstract
In the invention, the atmosphere in a vacuum chamber (1) is conditioned using a primary pump (3), a secondary pump (2), speed control means (6, 7) for controlling the speed of the primary pump, and at least first gas treatment means (5) adapted for treating the extracted gases downstream from the primary pump (3). The vacuum chamber (1) is contained in a room (130) having a false floor (36) covering a space (37). The primary pump (3) and the gas treatment means (5) are housed in the available space (37) under the false floor (36), so that the secondary pump (2) can be placed in the immediate vicinity of the vacuum chamber (1), and the primary pump (3) is in the proximity of the vacuum chamber (1).
Claims13
Apparatus for conditioning the atmosphere in a vacuum chamber, said apparatus comprising:
- a pumping line comprising a primary pump and at least one upstream secondary pump;
- downstream from the primary pump, gas treatment means for treating the extracted gases;
- wherein:
- the vacuum chamber is contained in a room having a false floor covering a space;
- and
- the primary pump is housed in the available space under the false floor, in the proximity of the vacuum chamber.
Dependencies are inferred from the claim text.