Calorimeter and manufacturing method thereof
AssigneeSeiko Instruments Inc.
InventorsKeiichi Tanaka, Toshimitsu Morooka
Life of this patent
Estimating the term…
Abstract
A colorimeter has an absorber for absorbing radiation energy and converting the radiation energy into thermal energy. A resistor is connected to the absorber for converting thermal energy into an electrical signal. A membrane is connected to the resistor for controlling a thermal discharge from the resistor. A substrate is connected to the membrane and has a tri-layer structure comprised of an etching layer having a preselected thickness, an etching stop layer and a support substrate. The membrane is spaced-apart from a main surface of the etching stop layer by the preselected thickness of the etching layer.
Claims9
A calorimeter comprising:
- an absorber for absorbing radiation energy and converting the radiation energy into thermal energy;
- a resistor connected to the absorber for converting thermal energy into an electrical signal;
- a membrane connected to the resistor for controlling a thermal discharge from the resistor;
- and a substrate connected to the membrane and having a tri-layer structure comprised of an etching layer having a preselected thickness, an etching stop layer and a support substrate, the membrane being spaced-apart from an upper main surface of the etching stop layer by the preselected thickness of the etching layer.
A method of manufacturing a calorimeter, comprising the steps of:
- providing a substrate having a tri-layer structure comprised of an etching layer having a preselected thickness, an etching stop layer and a support substrate;
- disposing an absorber over the substrate for converting radiation energy into thermal energy;
- connecting a resistor to the absorber for converting thermal energy into an electrical signal;
- disposing a membrane on the resistor in spaced-apart relation from an upper main surface of the etching stop layer by the preselected thickness of the etching layer and in a given direction for controlling a thermal discharge from the resistor;
- and etching the etching layer.
A method of manufacturing a calorimeter, comprising the steps of:
- providing a substrate having a tri-layer structure comprised of an etching layer formed from silicon with a planar orientation of (100), an etching stop layer and a support substrate;
- disposing an absorber over the substrate for converting radiation energy into thermal energy;
- connecting a resistor to the absorber for converting thermal energy into an electrical signal;
- disposing a membrane on the resistor in a given direction at an orientation of <100> for controlling a thermal discharge from the resistor;
- and etching the etching layer.
A calorimeter comprising:
- a substrate having a tri-layer structure comprised of a support substrate, an etching stop layer disposed on the support substrate, and an etching layer disposed on the etching stop layer and having a preselected thickness and a hollow portion;
- an absorber disposed over the substrate for absorbing radiation energy and converting the absorbed radiation energy into thermal energy;
- a resistor connected to the absorber for converting the thermal energy into an electrical signal;
- and
- a membrane disposed over the hollow portion of the etching layer and spaced-apart from an upper main surface of the etching stop layer by the preselected thickness of the etching layer, the membrane being connected to the resistor for controlling a thermal discharge from the resistor.
A calorimeter comprising:
- a substrate having a tri-layer structure and comprised of a support substrate, an etching stop layer disposed on the support substrate and having a main surface, and a silicon etching layer having a planar orientation of (100) and disposed on the main surface of the etching stop layer;
- an absorber disposed over the substrate for absorbing radiation energy and converting the absorbed radiation energy into thermal energy;
- a resistor connected to the absorber for converting the thermal energy into an electrical signal;
- and a membrane disposed on the resistor at an orientation of <100> and spaced-apart from the upper main surface of the etching stop layer by a thickness of the etching layer.
Dependencies are inferred from the claim text.