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US 6,648,307 B2Granted
Method to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized
AssigneeFSI International, Inc.
InventorsSteven L. Nelson, Kurt K. Christenson
Life of this patent
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Abstract
A method for increasing the quantity of a gas, e.g., ozone, dissolved in a liquid, e.g., ultrapure deionized water, is provided. The gas to be dissolved is introduced to the liquid under pressure and the resulting admixture delivered to the end-use station under pressure. Thus, the method and system of the present invention are able to provide, e.g., ozonated water, continuously, efficiently and without cooling, thus providing a simple, cost efficient method of producing high concentration ozonated water for application to an in-process semiconductor wafer.
Claims10
A treatment method comprising the steps of:
- positioning at least one in-process silicon wafer in a chamber;
- providing an aqueous composition, said composition being made by a method comprising the step dissolving an amount of ozone into a pressurized aqueous liquid in an amount to form an aqueous ozone composition;
- and
- dispensing the pressurized aqueous ozone composition into the chamber under supersaturated conditions effective to treat the in-process silicon wafer.
1 more element
Dependencies are inferred from the claim text.