Method and system for eliminating post etch residues
AssigneeAdvanced Micro Devices, Inc.
InventorsJiahua Huang, Yue-Song He, Frank Mak
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Abstract
A method and system for eliminating post etch residues is disclosed. In one method embodiment, the present invention recites disposing a surface, having post etch residues adhered thereto, proximate to an electron beam source which generates electrons. The present method embodiment then recites bombarding the post etch residues with the electrons such that the post etch residues are removed from the surface to which the post etch residues were adhered.
Claims13
A method for removing post etch residues using an electron beam-based inspection tool comprising a focussed electron beam source, said method comprising the steps of:
- a) disposing a surface, having post etch residues adhered thereto, proximate to said focussed electron beam source which generates electrons;
- and
- b) bombarding said post etch residues with said electrons such that said post etch residues are removed from said surface to which said post etch residues were adhered.
A method for removing post etch residues using an electron beam-based inspection tool comprising a focussed electron beam source, said method comprising the steps of:
- a) disposing a surface, having post etch residues adhered thereto, proximate to said focussed electron beam source which generates electrons, said surface disposed proximate said focussed electron beam source by controllably moving a structure, on which said surface is located, with respect to said electron beam source;
- b) bombarding said post etch residues with said electrons such that said post etch residues are removed from said surface to which said post etch residues were adhered, said steps a) and b) performed without the use of toxic waste generating chemicals, without significantly heating said post etch residues and the surface to which said post etch residues were adhered;
- and
- c) transporting said post etch residues away from said surface to which said post etch residues were adhered by generating a vacuum proximate said surface.
Dependencies are inferred from the claim text.