Apparatus and method for measuring residual stress and photoelastic effect of optical fiber
AssigneeSamsung Electronics Co., Ltd.
InventorsDug-Young Kim, Yong-Woo Park, Un-Chul Paek, Mun-Hyun Do
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AssigneeSamsung Electronics Co., Ltd.
InventorsDug-Young Kim, Yong-Woo Park, Un-Chul Paek, Mun-Hyun Do
Estimating the term…
Disclosed is an apparatus for measuring a residual stress and a photoelastic effect of an optical fiber, which includes: a light source; a rotary type optical diffuser distanced from the light source in a predetermined distance for suppressing the spatial coherence of a light radiated in the light source; an optical condenser for condensing the radiated light passed through the optical diffuser into a spot where the optical fiber is located; a polarizer for polarizing the light passed through the optical condenser into a 45° linear polarized light from an axis of the optical fiber; a polarization analyzer, installed at 90° angle with respect to the polariscope and attached closely with the optical fiber, to prevent the penetration by the background image of the optical fiber; an optical fiber strain unit including a strain sensor for straining the optical fiber on the polarization analyzer toward a longitudinal direction and measuring the strain on the optical fiber; an object lens for magnifying the image of the light penetrated through the optical fiber; and a charge coupled device (CCD) array for measuring the penetration variation of the optical fiber caused from the strain caused by the optical fiber strain unit over the optical fiber.
An apparatus for measuring a residual stress and photoelastic effect of an optical fiber, the apparatus comprising:
Dependencies are inferred from the claim text.