X-ray fluorescence spectrometer
AssigneeRigaku Industrial Corporation
InventorsNaoki Kawahara, Kouichi Aoyagi, Yasujiro Yamada
Life of this patent
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Abstract
To provide an X-ray fluorescence spectrometer capable of providing a stable fluorescent X-ray intensity regardless of the presence of irregularities or the like on a surface of a sample to be analyzed, the X-ray fluorescence spectrometer includes an X-ray source 1 including a primary X-ray limiting diaphragm 3. An aperture 3a of the primary X-ray limiting diaphragm 3 is of a shape effective to allow change in intensity of fluorescent X-rays 7 measured by a detector 8 to be not higher than 1% in the event that a height of the sample surface 5a relative to the X-ray source 1 and the detector 8 changes 1 mm at maximum.
Claims5
A X-ray fluorescence spectrometer which comprises:
- a sample support table for supporting thereon a sample to be analyzed;
- an X-ray source for radiating primary X-rays so as to impinge slantwise on a flat surface of the sample and including a primary X-ray limiting diaphragm for limiting a bundle of the primary X-rays emitted therefrom towards the sample surface, said primary X-ray limiting diaphragm having an aperture;
- and
- a detecting means positioned so as to aim slantwise at the sample surface for measuring an intensity of fluorescent X-rays emitted from a site of interest of the sample, said detecting means including a field limiting diaphragm for limiting a field of view encompassing the sample surface and a soller slit for collimating the fluorescent X-rays emitted from the sample, said field limiting diaphragm having an aperture;
- wherein the aperture of the primary X-ray limiting diaphragm is of a shape effective to allow change in intensity of the fluorescent X-rays measured by the detecting means to be not higher than 1% in the event that a height of the sample surface relative to the X-ray source and the detecting means changes 1 mm at maximum.
Dependencies are inferred from the claim text.