Semiconductor device
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsToshiaki Iwamatsu, Takashi Ipposhi, Hideki Naruoka, Nobuyoshi Hattori, Shigeto Maegawa, Yasuo Yamaguchi, Takuji Matsumoto
Life of this patent
Estimating the term…
Loading patent…
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsToshiaki Iwamatsu, Takashi Ipposhi, Hideki Naruoka, Nobuyoshi Hattori, Shigeto Maegawa, Yasuo Yamaguchi, Takuji Matsumoto
Estimating the term…
A semiconductor device that prevents metal pollution and a method of manufacturing the semiconductor device. A region (NR) and a region (PR) are defined by a trench isolation oxide film, a polysilicon film selectively provided on the trench isolation oxide film, a silicon layer provided on the polysilicon film, and a side wall spacer provided on a side surface of the polysilicon film. The polysilicon film is provided in a position corresponding to a top of a PN junction portion JP of a P-type well region and an N-type well region in a SOI layer across the two well regions.
A semiconductor device comprising:
A semiconductor device comprising:
Dependencies are inferred from the claim text.