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AssigneeKLA-Tencor Corporation
InventorsMatthias C. Krantz, Donald W. Pettibone, Damon F. Kvamme, Stan Stokowski
Estimating the term…
Provided are apparatus and methods for detecting phase defects. The invention relies generally on the distortion of light as it passes through defects in phase shift masks to detect these defects. Light traveling through a defect, such as a bump in an etched area will travel at a different rate than light traveling through air. In order to enhance the signals generated from the defects, the invention in several embodiments provides a defocused light inspection beam by setting the focus of the beam to a level above or below the photomask subject to inspection. The light from the photomask is collected by a detector split into at least two portions, each generating a signal. A resulting differential signal produced from the signals generated at each of the two detector portions is used to determine whether a defect in the photomask is present, in one embodiment, by generating an image from the resulting signal.
A method for detecting phase defects in a semiconductor processing photomask, the method comprising:
A method for detecting phase defects in a semiconductor processing photomask, the method comprising:
A method for detecting phase defects in a semiconductor processing photomask, the method comprising:
A scanning optical microscopy system configured to detect phase defects in a semiconductor processing photomask comprising:
A scanning optical microscopy system configured to detect phase defects in a semiconductor processing photomask comprising:
Dependencies are inferred from the claim text.