Charged particle beam exposure system and method

A charged particle beam exposure system for exposing a pattern on an object by a charged particle beam, comprising:

• beam source means for producing a charged particle beam, said beam source means emitting said charged particle beam toward an object on which a pattern is to be exposed, along an optical axis;
• beam shaping means for shaping said charged particle beam to produce a plurality of charged particle beam elements in accordance with exposure data indicative of a dot pattern to be exposed on said object;
• focusing means for focusing said charged particle beam elements upon a surface of said object;
• and
• deflection means for deflecting said charged particle beam elements over said surface of said object;
• said beam shaping means comprising:
• a beam shaping mask carrying thereon a plurality of apertures for producing a charged particle beam element by shaping said charged particle beam and a plurality of deflectors each provided in correspondence to one of said plurality of apertures, said beam shaping means further including a plurality of electrode pads each connected to a corresponding deflector on said beam shaping means;
• a mask holder provided on a body of said charged particle beam exposure system for holding said beam shaping mask detachably thereon, said mask holder comprising:
• a stationary part fixed upon said body of said charged particle beam exposure system;
• a movable part provided movably upon said stationary pare such that said movable part moves in a first direction generally parallel to said optical axis and further in a second direction generally perpendicular to said optical axis, said movable part carrying said beam shaping mask detachably;
• a drive mechanism for moving said movable part in said first and second directions;
• and
• a contact structure provided on said body of said charged particle beam exposure system for contacting with said electrode pads on said beam shaping mask, said contact structure including a base body and a plurality of electrode pins extending from said base, said or said electrode pins having a first end connected to said base body of said contact structure and a second, free end adapted for engagement with said electrode pads on said beam shaping mask.