Lithographic projection apparatus

A device manufacturing method comprising:

• providing a substrate which is at least partially covered by a layer of radiation-sensitive material;
• providing a mask which contains a pattern;
• using a projection beam of radiation to project an image of at least a part of the mask pattern onto a target area of the layer of radiation-sensitive material of the substrate while on a substrate table disposed in a chamber;
• and
• directing radiation of a second type onto the substrate according to a certain pattern while on the substrate table disposed in said chamber.

A lithographic projection apparatus comprising:

• a primary radiation source constructed and arranged to supply a projection beam of a first radiation;
• a mask table for holding a mask;
• a substrate table for supporting a substrate;
• a projection system that images a portion of the mask, irradiated by the projection beam, onto a target portion of the substrate;
• a secondary radiation source constructed and arranged to supply a second radiation, which can be directed onto the substrate;
• and
• a radiation pattern controller constructed and arranged to pattern said second radiation so that it impinges on the substrate according to a desired pattern such that the sum of the fluxes of the first and second radiations at substrate level causes an elevation of the substrate temperature which is substantially constant across at least a given area of the substrate.

A device manufacturing method comprising:

• providing a substrate which is at least partially covered by a layer of radiation-sensitive material;
• providing a mask which contains a pattern;
• using a projection beam of a first radiation to project an image of at least a part of the mask pattern onto a target area of the layer of radiation-sensitive material;
• and
• directing a second radiation onto the substrate according to a certain pattern, such that the sum of the fluxes of the first and second radiations at substrate level causes an elevation of the substrate temperature which is substantially constant across at least a given area of the substrate.