Method of sample preparation for transmission electron microscope analysis
AssigneeUnited Microelectronics Corp.
InventorsWen-Tung Chang, Hsing-Shuang Chou, Jing-Fang Chiu
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Abstract
A method of sample preparation for transmission electron microscope analysis is disclosed. The method renders a typical TEM analysis on a sample having a photoresist layer practical. The method uses a conductive layer and a dielectric layer to protect a photoresist layer of the TEM sample from slicing damage and ion bombardment. The conductive layer and the dielectric layer can also isolate the photoresist layer from moisture and oxygen containing environments and prevent the photoresist layer from shrinking. Moreover, the entire TEM sample preparation process need not use any organic solvent or water to clean the sample.
Claims35
A method of sample preparation for transmission electron microscope analysis, said method comprising:
- providing a substrate having a photoresist layer thereon;
- forming a dielectric layer over said substrate;
- and
- slicing said substrate.
A method of sample preparation for transmission electron microscope analysis, said method comprising:
- providing a substrate having a photoresist layer thereon;
- forming a conductive layer over said substrate by a first physical vapor deposition process;
- forming a dielectric layer over said conductive layer by a second physical vapor deposition process;
- and
- slicing said substrate.
A method of sample preparation for transmission electron microscope analysis, said method comprising:
- providing a substrate having a photoresist layer thereon;
- forming a conductive layer over said substrate by a first sputtering deposition process;
- forming a dielectric layer over said conductive layer by a second sputtering deposition process;
- and
- slicing said substrate.
Dependencies are inferred from the claim text.