Fluoride cleaning masking system
AssigneeUnited Technologies Corporation
InventorsBeth Kwiatkowski Abriles, Bryan W. Manis, Murali N. Madhava
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AssigneeUnited Technologies Corporation
InventorsBeth Kwiatkowski Abriles, Bryan W. Manis, Murali N. Madhava
Estimating the term…
The present invention relates to a maskant system for use with a fluoride cleaning system. The maskant system comprises a parting compound applied to a surface which requires protection and a chromium rich maskant for substantially preventing intergranular attack and which reduces a depletion zone. The parting compound contains colloidal silica, de-ionized water, fused alumina grains, and alumina powder. The maskant is comprised of chromium powder mixed with a binder, a wetting agent, a thickening agent, and water. The maskant system may be used to clean components formed from nickel-based or cobalt-based alloys using a fluoride cleaning system and has particular utility when components formed from single crystal nickel based alloys are cleaned using a fluoride cleaning system.
A maskant system for use with a fluoride cleaning treatment which comprises:
A method for cleaning a component formed from a nickel base or cobalt base alloy comprising the steps of:
Dependencies are inferred from the claim text.