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AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsHiroki Takewaka, Takao Kamoshima, Junko Izumitani
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The invention provides a method of manufacturing a semiconductor device which can reduce or prevent abrasive material from remaining in an indentation in a surface after a CMP process. After forming a titanium nitride film (5), a tungsten film (6) is formed on an entire surface. The temperature is set at approximately 430° C. for the reaction and, first, 50 sccm of WF6, 10 sccm of SiH4 and 1000 sccm of H2 are used in the atmosphere of 30 Torr of Ar, N2 so as to form a seed layer with a film thickness of approximately 100 nm. After that, in the atmosphere of 80 Torr of Ar, N2, 75 sccm of WF6 and 500 sccm of H2 are used as a reactive gas so as to layer a film with a thickness of approximately 300 nm. The tungsten film (6) has grains (6a) in a pillar form of which the grain diameter is small to the degree that the abrasive material (50) used in the CMP process does not easily become caught in the gaps between the grains. Concretely, the tungsten film (6) has grains (6a) of which the diameter is approximately 10 nm to 20 nm.
A method of manufacturing a semiconductor device, comprising the steps of:
A method of manufacturing a semiconductor device, comprising the steps of:
A method of manufacturing a semiconductor device, comprising the steps of:
Dependencies are inferred from the claim text.