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US 6,645,788 B2Granted
CMOS imager and method of formation
AssigneeMicron Technology, Inc.
InventorHoward E. Rhodes
Life of this patent
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Abstract
A CMOS imager having an epitaxial layer formed below pixel sensor cells is disclosed. An epitaxial layer is formed between a semiconductor substrate and a photosensitive region to improve the cross-talk between pixel cells. The thickness of the epitaxial layer is optimized so that the collection of signal carriers by the photosensitive region is maximized.
Claims9
A method of forming a photosensor for an imaging device, said method comprising the steps of:
- forming an epitaxial layer of a first conductivity type over a substrate;
- forming a well of said first conductivity type in an upper portion of said epitaxial layer;
- and
- forming a photosensor at an upper portion of said well.
1 more element
Dependencies are inferred from the claim text.