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US 6,645,692 B2Granted
Photoresist composition
AssigneeSumitomo Chemical Company, Limited
InventorKatsuhiko Namba
Life of this patent
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Abstract
A photoresist composition comprising a binder component, an acid generator and a surface active agent containing fluorine atom(s) is provided, and the photoresist composition reduces development deficiency generated at the time of development significantly without lowering the resolution, the profile, or the like. The surface active agent is poly trifluorobutyl methyl siloxane.
Claims4
A photoresist composition comprising a binder component, an acid generator and poly-trifluorobutyl methyl siloxane as a surface active agent containing fluorine atom(s).
Dependencies are inferred from the claim text.