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US 6,645,633 B2Granted
Autodeposition compositions
AssigneeHenkel Corporation
InventorsChristopher G. Weller, Elizabeth J. Siebert, Zhiqi Yang, Rajat K. Agarwal, William E. Fristad, Brian D. Bammel
Life of this patent
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Abstract
Autodeposition compositions for polymeric coatings of reduced gloss, good corrosion resistance, and uniform appearance are prepared using a combination of acrylic and epoxy resins.
Claims22
An autodeposition composition comprising:
- (a) water;
- (b) at least one epoxy resin in dispersed form;
- (c) at least one acrylic resin in dispersed form;
- and
- (d) at least one epoxy curing agent;
- wherein said epoxy resin, said acrylic resin, and said epoxy curing agent are present in a weight ratio of acrylic resin:
- (epoxy resin+epoxy curing agent) of from 5:95 to 60:40.
4 more elements
A method of making an autodeposition composition comprising the steps of:
- (a) contacting an acrylic resin dispersion with at least one additive selected from the group consisting of surfactants and coalescing solvents to form a conditioned acrylic resin dispersion;
- and
- (b) combining the conditioned acrylic resin dispersion with an epoxy resin dispersion comprised of water, at least one epoxy resin and at least one epoxy curing agent to form the autodeposition composition.
An autodeposition composition comprising;
- a) water;
- b) at least one epoxy resin in dispersed form, prepared by reacting a diglycidyl ether of a polyhydric phenol, a flexibilizing epoxy resin, and a chain extender containing at least two epoxy reactive groups selected from hydroxyl, carboxylic acid, carboxylic acid anhydride and combinations thereof;
- c) at least one acrylic resin in dispersed form;
- and
- d) at least one epoxy curing agent;
- wherein at least one acrylic resin is contacted in dispersion form with at least one additive selected from the group consisting of surfactants and coalescing solvents before being combined with the epoxy resin and epoxy curing agent.
3 more elements
Dependencies are inferred from the claim text.