Back to results
US 6,645,364 B2Granted
Electroplating bath control
AssigneeShipley Company, L.L.C.
InventorsJeffrey M. Calvert, Robert A. Binstead
Life of this patent
Estimating the term…
Abstract
Disclosed is a method of analyzing components in an electroplating bath. Also disclosed is a method of controlling electroplating baths by monitoring the components of the plating bath in real-time.
Claims10
A method for determining the level of one or more components in an electroplating bath comprising the steps of:
- a) obtaining a plurality of solutions wherein each solution has known and different concentrations of an analyte, but where the quantity of the analyte in each solution differs from the quantity in the other solutions;
- b) providing an apparatus having a first chamber and a second chamber, the first chamber being separated from the second chamber by a liquid-impermeable, gas-permeable membrane;
- c) introducing each solution individually into the first chamber and carrying out a predetermined sequence of steps comprising:
- i) reducing the pressure in the second chamber relative to the first chamber to produce a gas stream;
- ii) directing at least a portion of the gas stream to a mass spectrometer;
- iii) measuring a characteristic mass/charge peak for the analyte;
- d) for each solution, correlating the quantity of analyte with the measurement of the characteristic mass/charge peak;
- e) introducing a bath having an unknown quantity of the analyte into the first chamber;
- f) performing the predetermined sequence of steps;
- and
- g) choosing from the correlation in step d) a quantity of the analyte which corresponds to the measured characteristic mass/charge peak measurement for the analyte.
8 more elements
A method for electrolytically depositing metal on a substrate comprising the steps of:
- a) contacting the substrate with an electroplating bath comprising a source of metal ions, and electrolyte and one or more organic additives;
- b) subjecting the electroplating bath to sufficient current density for a period of time sufficient to deposit a desired thickness of metal on the substrate;
- and
- c) monitoring the one or more organic additives by
- i) obtaining a plurality of solutions wherein each solution has known and different concentrations of an organic additive, but where the quantity of the organic additive in each solution differs from the quantity in the other solutions;
- ii) providing an apparatus having a first chamber and a second chamber, the first chamber being separated from the second chamber by a liquid-impermeable, gas-permeable membrane;
- iii) introducing each solution individually into the first chamber and carrying out a predetermined sequence of steps comprising:
- aa) reducing the pressure in the second chamber relative to the first chamber to produce a gas stream;
- bb) directing at least a portion of the gas stream to a mass spectrometer;
- cc) measuring a characteristic mass/charge peak for the organic additive;
- iv) for each solution, correlating the quantity of organic additive with the measurement of the characteristic mass/charge peak;
- v) introducing a portion of the electroplating bath having an unknown quantity of the organic additive into the first chamber;
- vi) performing the predetermined sequence of steps;
- and
- vii) choosing from the correlation in step iv) a quantity of the organic additive which corresponds to the measured characteristic mass/charge peak measurement for the organic additive.
12 more elements
Dependencies are inferred from the claim text.