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AssigneeJsr Corporation
InventorsKou Hasegawa, Tomoo Koumura, Yutaka Kobayashi
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It is an object of the invention to provide a composition for forming a polishing pad comprising substances having specific functional groups exhibiting excellent hydrophilic properties and the like, a crosslinked body for polishing pad as well as a polishing pad with excellent water resisting and durability which exhibits excellent polishing performance including a high removal rate and method for producing thereof. The composition for forming a polishing pad comprises a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups. And a water-soluble substance such as cyclodextrin may be contained. A polishing pad can be manufactured using the composition above or the crosslinked body for polishing pad, and porous polishing pads may also be obtained.
A composition for forming a polishing pad comprising [A] a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid or phosphoric acid groups, [B] a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and [C] a water-soluble substance.
A polishing pad obtained from a composition comprising [A] a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid or phosphoric acid groups, [B] a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and [C] a water-soluble substance.
A method for producing a polishing pad comprising;
A composition for forming a polishing pad comprising [A] a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid or phosphoric acid groups, and [B] a water-insoluble polymer having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, wherein, when crosslinking said composition, [B] forms a matrix material by co-crosslinking with [A].
A polishing pad obtained by crosslinking a composition comprising [A] a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid or phosphoric acid groups, [B] a water-insoluble polymer having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and [D] a crosslinking agent, wherein [B] forms a matrix by co-crosslinking with [A].
A method for producing a polishing pad comprising:
A composition for forming a polishing pad comprising [A] a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid or phosphoric acid groups, and [B] a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, wherein said composition does not contain abrasive particles.
Dependencies are inferred from the claim text.