Polishing apparatus
AssigneesEbara Corporation, Kabushiki Kaisha Toshiba
InventorsNorio Kimura, You Ishii, Yoshikuni Tateyama
Life of this patent
Estimating the term…
Abstract
A polishing apparatus has a turntable with a polishing cloth attached thereto and a top ring for holding and pressing a workpiece to be polished against the polishing cloth under a certain pressure. The polishing apparatus also has a first dressing unit having a contact-type dresser for dressing the polishing cloth by bringing the contact-type dresser in contact with the polishing cloth, and a second dressing unit having a noncontact-type dresser for dressing the polishing cloth with a fluid jet applied therefrom to the polishing cloth. The contact-type dresser comprises a diamond dresser or an SiC dresser.
Claims11
A method of conditioning a polishing cloth attached to a turntable for polishing a workpiece, said method comprising:
- dressing the polishing cloth with a first dressing unit having a contact-type dresser as an initial conditioning before the polishing cloth is used for polishing;
- and
- dressing the polishing cloth with a second dressing unit having a noncontact-type dresser between polishing processes, each for polishing a workpiece,
- wherein the second dressing unit comprises a plurality of water jet nozzles which are positioned radially over the polishing cloth, and water jets are ejected from the plurality of water jet nozzles at a progressively higher speed or pressure in a radially outward direction from a center of the polishing cloth.
A method of conditioning a polishing cloth attached to a turntable for polishing a workpiece, said method comprising:
- dressing the polishing cloth with a first dressing unit having a contact-type dresser as an initial conditioning before the polishing cloth is used for polishing;
- and
- dressing the polishing cloth first with the first dressing unit and then with a second dressing unit having a noncontact-type dresser between polishing processes, each for polishing a workpiece,
- wherein the second dressing unit comprises a plurality of water jet nozzles which are positioned radially over the polishing cloth, and water jets are ejected from the plurality of water jet nozzles at a progressively higher speed or pressure in a radially outward direction from a center of the polishing cloth.
A polishing apparatus comprising:
- a turntable with a polishing cloth attached thereto;
- a top ring being operable to hold and press a workpiece to be polished against said polishing cloth under a certain pressure;
- a first dressing unit having a contact-type dresser, said first dressing unit being operable to dress said polishing cloth by bringing said contact-type dresser in contact with said polishing cloth;
- and
- a second dressing unit having a noncontact-type dresser, said second dressing unit being operable to dress said polishing cloth,
- wherein said noncontact-type dresser comprises a plurality of water jet nozzles which are positioned radially over said polishing cloth, and said plurality of water jet nozzles are operable to eject water jets at a progressively higher speed or pressure in a radially outward direction from a center of said polishing cloth.
A polishing apparatus comprising:
- a turntable with a polishing cloth attached thereto;
- a top ring being operable to hold and press a workpiece to be polished against said polishing cloth under a certain pressure;
- a first dressing unit having a contact-type dresser, said first dressing unit being operable to dress said polishing cloth by bringing said contact-type dresser in contact with said polishing cloth;
- and
- a second dressing unit comprising a noncontact-type dresser, said noncontact-type dresser having a plurality of water jet nozzles which are positioned radially over said polishing cloth;
- wherein the number of said water jet nozzles positioned over a central area of said polishing cloth is less than that of said water jet nozzles positioned over a peripheral area of said polishing cloth.
A polishing apparatus comprising:
- a polishing cloth to polish a workpiece;
- a top ring being operable to hold and press said workpiece to be polished against said polishing cloth under a certain pressure;
- a first dressing unit having a contact-type dresser, said first dressing unit being operable to dress said polishing cloth by bringing said contact-type dresser in contact with said polishing cloth;
- and
- a second dressing unit comprising a noncontact-type dresser, said noncontact-type dresser having a plurality of water jet nozzles which are positioned radially over said polishing cloth;
- wherein the distance between a nozzle outlet of each of said water jet nozzles and said polishing cloth is different from each other.
Dependencies are inferred from the claim text.