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US 6,643,353 B2Granted
Protective layer for multilayers exposed to x-rays
AssigneeOsmic, Inc.
InventorsBoris Verman, Karsten Joensen, Yuriy Platonov, Srivatsan Seshardi
Life of this patent
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Abstract
An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.
Claims45
An optical element for diffracting x-rays, comprising:
- a substrate;
- a diffraction structure applied to said substrate, said diffraction structure comprising an exterior surface facing away from said substrate and said diffraction structure capable of diffracting x-rays;
- and
- a protective layer applied to said exterior surface, wherein said protective layer has a structure that substantially absorbs x-rays.
1 more element
An x-ray system, comprising:
- an x-ray source emitting a set of x-rays;
- an optical element, comprising:
- a substrate;
- a diffraction structure applied to said substrate, said diffraction structure comprising an exterior surface facing away from said substrate and said diffraction structure diffracting said set of x-rays;
- and
- a protective layer applied to said exterior surface, wherein said protective layer has a structure that substantially absorbs said set of x-rays.
3 more elements
Dependencies are inferred from the claim text.