Method and a system for identifying gaseous effluents, and a facility provided with such a system

A gas analysis system for analyzing gases in a vacuum pumping line of a process chamber, said analysis system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases, wherein:

• the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source, mounted to the vacuum pumping line via an external coupling and in direct contact with the gases contained in the vacuum pumping line, and a generator for generating a plasma from the gases to be analyzed, further wherein the plasma source is a microwave source of the resonant cavity type;
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• the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing variation of the radiation spectrum emitted by the generated plasma.

A gas analysis system for analyzing gases in a vacuum pumping line of a process chamber, said analysis system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases, wherein:

• the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source, in contact with the gases contained in the vacuum pumping line, and a generator for generating a plasma from the gases to be analyzed, further wherein the plasma source is configured and arranged to generate plasma from the gas existing in the vacuum pumping line from a pressure of about 10−6 mbar up to atmospheric pressure;
• and
• the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing variation of the radiation spectrum emitted by the generated plasma.

A gas analysis system for analyzing gases in a vacuum pumping line of a process chamber, said analysis system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases, wherein:

• the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source, in contact with the gases contained in the vacuum pumping line, and a generator for generating a plasma from the gases to be analyzed, further wherein the gas analyzer operates in the pressure range of 0.1 mbars to 1000 mbars;
• and
• the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing variation of the radiation spectrum emitted by the generated plasma.

A gas analysis system for analyzing gases in a vacuum pumping line of a process chamber, said analysis system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases, wherein:

• the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source, inside the vacuum pumping line and in contact with the gases contained in the vacuum pumping line, and a generator for generating a plasma from the gases to be analyzed, further wherein the plasma source is a radio frequency plasma source of the inductively coupled plasma type;
• and
• the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing variation of the radiation spectrum emitted by the generated plasma.

A gas analysis system for analyzing gases in a vacuum pumping line of a process chamber, said analysis system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases, wherein:

• the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source, inside the vacuum pumping line and in contact with the gases contained in the vacuum pumping line, and a generator for generating a plasma from the gases to be analyzed, further wherein the plasma source is a radio frequency plasma source of the inductively coupled plasma type, the generator is an RF generator, and a dielectric, made of one of quartz and alumina, provides sealing and is transparent to electromagnetic waves;
• and
• the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing variation of the radiation spectrum emitted by the generated plasma.