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US 6,642,661 B2Granted
Method to affect spatial distribution of harmonic generation in a capacitive discharge reactor
AssigneeTokyo Electron Limited
InventorEric J. Strang
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AssigneeTokyo Electron Limited
InventorEric J. Strang
Estimating the term…
The present invention provides an apparatus and a method of generating and controlling plasma formed in a capacitively coupled plasma region between a plasma electrode and a bias electrode. The plasma electrode includes a plurality of sub-electrodes that are electrically insulated from one another. Radio frequency plasma generating electric power is provided to the plasma electrode. Radio frequency bias electric power, at a lower frequency than the plasma generating radio frequency electric power, is also provided. A first portion of the bias electric power is provided to the bias electrode, and a second portion of the bias electric power is provided to the plasma electrode. At least one filter, impedance matching network, phase shifter, and power splitter are used to affect the electric power provided to the electrodes.
A method of generating and controlling a plasma formed in a capacitively coupled plasma source having a plasma electrode and a bias electrode, the plasma electrode comprising a plurality of sub-electrodes that are electrically insulated from one another and the plasma being formed in a plasma region between the plasma electrode and the bias electrode, said method comprising:
An apparatus for generating and controlling a plasma comprising:
Dependencies are inferred from the claim text.