Insulated gate semiconductor device having first trench and second trench connected to the same

An insulated gate semiconductor device which comprises an MOS transistor structure, comprising:

• a semiconductor substrate of a first conductivity type having a first main surface and a second main surface which are opposed to each other in a third direction;
• a base layer of a second conductivity type formed from a cell region in said first main surface and a region in said first main surface which is defined by one end which is a boundary between said cell region and a terminal region adjacent to said cell region and the other end away from said boundary towards said terminal region by a first distance along a first direction, towards an inside of said semiconductor substrate along said third direction;
• a first trench formed from said cell region in said first main surface, through said base layer, up to said inside of said semiconductor substrate along said third direction;
• a first gate insulating film formed entirely on a bottom surface and side surfaces of said first trench;
• and
• a first main electrode formed on said second main surface,
• wherein said first direction is parallel to said first main surface and orthogonal to said third direction,
• a first depth from said first main surface to a bottom surface of said base layer is smaller than a second depth from said first main surface to said bottom surface of said first trench,
• said first trench has a plurality of first portions and a plurality of second portions,
• said plurality of first portions are arranged along a second direction orthogonal to said first direction and said third direction,
• each of said plurality of first portions has one end portion located on said boundary between said cell region and said terminal region and extends towards said one end portion along said first direction, and
• each of said plurality of second portions is located between adjacent first portions out of said plurality of first portions and extends along said second direction to connect said adjacent first portions to each other,
• said insulated gate semiconductor device further comprising:
• a plurality of second main electrode regions of said first conductivity type, each of which is formed from a region in said cell region of said first main surface which is surrounded by said adjacent first portions and adjacent second portions out of said plurality of second portions corresponding to said adjacent first portions towards an inside of said base layer along upper portions of side surfaces of said adjacent first portions and upper portions of side surfaces of said adjacent second portions;
• a first gate control electrode so formed inside said first trench as to be located beneath an upper surface of said first trench, said first gate control electrode filling said first trench with said first gate insulating film interposed therebetween;
• a second trench formed from a region in said first main surface which is defined by one end which is said boundary and the other end away from said boundary towards said terminal region by a second distance shorter than said first distance along said first direction, through said base layer, up to said inside of said semiconductor substrate along said third direction, said second trench having a third depth larger than said first depth and extending along said second direction while being connected to said one end portion which each of said plurality of first portions has;
• a second gate insulating film formed entirely on a bottom surface and side surfaces of said second trench;
• a second gate control electrode so formed inside said second trench as to be located beneath an upper surface of said second trench, said second gate control electrode filling said second trench with said second gate insulating film interposed therebetween and being electrically connected to said first gate control electrode at said one end portion which each of said plurality of first portions has;
• an insulating layer formed on an upper surface of said base layer, an upper surface of said first gate control electrode, an upper surface of said first gate insulating film, an upper surface of said second gate control electrode, an upper surface of said second gate insulating film and a region in said terminal region of said first main surface which is located outside an end of said base layer;
• a plurality of first contact portions each so formed in said insulating layer as to expose part of an upper surface which each of said plurality of second main electrode regions has and an upper surface of a portion in said base layer which is surrounded by each of said plurality of second main electrode regions;
• a plurality of second contact portions each so formed in said insulating layer as to expose part of an upper surface of a portion in said base layer which is surrounded by a side surface of said second trench on the side of said boundary, side surfaces of said adjacent first portions and a side surface of an outermost second portion of said plurality of second portions which faces said second trench;
• a first electrode layer for second main electrode formed in said plurality of first contact portions and said plurality of second contact portions and on a portion in said insulating layer which is located on said cell region of said first main surface, having one end portion away from said boundary by a seventh distance along said first direction, extending along said second direction and being electrically connected to each of said plurality of second main electrode regions and said base layer;
• a third contact portion so formed in said insulating layer as to expose part of said upper surface of said second gate control electrode;
• a gate electrode formed inside said third contact portion, on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said cell region along said first direction by a third distance shorter than said seventh distance and on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said terminal region along said first direction by a fourth distance shorter than said first distance, said gate electrode extending along said second direction and being electrically connected to said second gate control electrode through said third contact portion;
• a fourth contact portion so formed in said insulating:layer as to expose part of an upper surface of a portion in said base layer which is sandwiched between a location away from said boundary towards said terminal region along said first direction by a fifth distance which is shorter than said first distance and longer than said fourth distance and said other end of said base layer away from said boundary by said first distance;
• and
• a second electrode layer for second main electrode formed in said fourth contact portion and on a portion in said insulating layer which is defined by said location away from said boundary towards said terminal region along said first direction by said fifth distance and a location away from said boundary towards said terminal region along said first direction by a sixth distance longer than said first distance, extending along said second direction and being electrically connected to said base layer through said fourth contact portion,
• wherein both the length of said first electrode layer for second main electrode and that of said second electrode layer for second main electrode along said second direction are longer than the length of said gate electrode along said second direction,
• said insulated gate semiconductor device further comprising:
• a connection layer having a side surface which is being away from one end portion of said gate electrode in said second direction by a predetermined distance along said second direction and extends along said first direction, being formed on a portion of said insulating layer which is defined by said one end portion of said first electrode layer for second main electrode and said location away from said boundary towards said terminal region by said fifth distance along said first direction, and configured to electrically connect said first electrode layer for second main electrode and said second electrode layer for second main electrode to each other.

An insulated gate semiconductor device which comprises an MOS transistor structure, comprising:

• a semiconductor substrate of a first conductivity type having a first main surface and a second main surface which are opposed to each other in a third direction;
• a base layer of a second conductivity type formed from a cell region in said first main surface towards a first bottom surface located inside said semiconductor substrate along said third direction, having one end portion located on a boundary between said cell region and a terminal region adjacent to said cell region and a first depth from said first main surface to said first bottom surface;
• a well layer of said second conductivity type, being connected to said one end portion of said base layer in said boundary, formed from a region in said terminal region of said first main surface which is defined by one end which is said boundary and the other end away from said boundary towards said terminal region by a first distance along said first direction, towards a fourth bottom surface located inside said semiconductor substrate along said third direction, and having a fourth depth from said first main surface to said fourth bottom surface;
• a first trench formed from said cell region in said first main surface, through said base layer, up to a second bottom surface located inside said semiconductor substrate along said third direction, and having a second depth from said first main surface to said second bottom surface;
• a first gate insulating film formed entirely on said second bottom surface and side surfaces of said first trench;
• and
• a first main electrode formed on said second main surface,
• wherein said first direction is parallel to said first main surface and orthogonal to said third direction,
• said first depth is smaller than said second depth,
• said second depth is smaller than said fourth depth,
• said well layer further has a base-layer covering portion formed from a portion in said first bottom surface of said base layer which is sandwiched between said boundary and a location away from said boundary by a fifth distance along said first direction, towards said fourth bottom surface of said well layer up to an inside of said semiconductor substrate,
• said first trench has a plurality of first portions and a plurality of second portions,
• said plurality of first portions are arranged along a second direction orthogonal to said first direction and said third direction,
• each of said plurality of first portions has one end portion located on said boundary between said cell region and said terminal region and extends towards said one end portion along said first direction, and
• each of said plurality of second portions is located between adjacent first portions out of said plurality of first portions and extends along said second direction to connect said adjacent first portions to each other,
• said insulated gate semiconductor device further comprising:
• a plurality of second main electrode regions of said first conductivity type, each of which is formed from a region in said cell region of said first main surface which is surrounded by said adjacent first portions and adjacent second portions out of said plurality of second portions corresponding to said adjacent first portions towards an inside of said base layer along upper portions of side surfaces of said adjacent first portions and upper portions of side surfaces of said adjacent second portions;
• a first gate control electrode so formed inside said first trench as to be located beneath an upper surface of said first trench, said first gate control electrode filling said first trench with said first gate insulating film interposed therebetween;
• a second trench formed from a region in said first main surface which is defined by said one end which is said boundary and the other end away from said boundary towards said terminal region by a second distance shorter than said first distance along said first direction, up to a third bottom surface located inside said well layer along said third direction, said second trench having a third depth from said first main surface to said third bottom surface and extending along said second direction while being connected to said one end portion which each of said plurality of first portions has;
• a second gate insulating film formed entirely on said third bottom surface and side surfaces of said second trench;
• a second gate control electrode so formed inside said second trench as to be located beneath an upper surface of said second trench, said second gate control electrode filling said second trench with said second gate insulating film interposed therebetween and being electrically connected to said first gate control electrode at said one end portion which each of said plurality of first portions has;
• an insulating layer formed on an upper surface of said base layer, an upper surface of said first gate control electrode, an upper surface of said first gate insulating film, an upper surface of said second gate control electrode, an upper surface of said second gate insulating film, an upper surface of said well layer and a region in said terminal region of said first main surface which is located outside an end of said well layer;
• a plurality of first contact portions each so formed in said insulating layer as to expose part of an upper surface which each of said plurality of second main electrode regions has and an upper surface of a portion in said base layer which is surrounded by each of said plurality of second main electrode regions;
• a plurality of second contact portions each so formed in said insulating layer as to expose part of an upper surface of a portion in said base layer which is surrounded by a side surface of said second trench on the side of said boundary, side surfaces of said adjacent first portions and a side surface of an outermost second portion of said plurality of second portions which faces said second trench;
• a second main electrode formed in said plurality of first contact portions and said plurality of second contact portions and on a portion in said insulating layer which is located on said cell region of said first main surface, having one end portion away from said boundary by a sixth distance larger than said fifth distance along said first direction, extending along said second direction and being electrically connected to each of said plurality of second main electrode regions and said base layer;
• a third contact portion so formed in said insulating layer as to expose part of said upper surface of said second gate control electrode;
• and
• a gate electrode formed inside said third contact portion, on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said cell region along said first direction by a third distance shorter than said fifth distance and on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said terminal region along said first direction by a fourth distance longer than said first distance, said gate electrode extending along said second direction and being electrically connected to said second gate control electrode through said third contact portion,
• wherein said third depth is larger than said first depth, and
• said fourth depth is larger than said third depth.

An insulated gate semiconductor device which comprises an MOS transistor structure, comprising:

• a semiconductor substrate of a first conductivity type having a first main surface and a second main surface which are opposed to each other in a third direction;
• a base layer of a second conductivity type formed from a cell region in said first main surface towards a first bottom surface located inside said semiconductor substrate along said third direction, having one end portion located on a boundary between said cell region and a terminal region adjacent to said cell region and a first depth from said first main surface to said first bottom surface;
• a well layer of said second conductivity type, being connected to said one end portion of said base layer in said boundary, formed from a region in said terminal region of said first main surface which is defined by one end which is said boundary and the other end away from said boundary towards said terminal region by a first distance along said first direction, towards a fourth bottom surface located inside said semiconductor substrate along said third direction, and having a fourth depth from said first main surface to said fourth bottom surface;
• a first trench formed from said cell region in said first main surface, through said base layer, up to a second bottom surface located inside said semiconductor substrate along said third direction, and having a second depth from said first main surface to said second bottom surface;
• a first gate insulating film formed entirely on said second bottom surface and side surfaces of said first trench;
• and
• a first main electrode formed on said second main surface,
• wherein said first direction is parallel to said first main surface and orthogonal to said third direction,
• said first depth is smaller than said second depth,
• said second depth is smaller than said fourth depth,
• said well layer further has a base-layer covering portion formed from a portion in said second bottom surface of said base layer which is sandwiched between said boundary and a location away from said boundary by an eighth distance along said first direction, towards said fourth bottom surface of said well layer up to an inside of said semiconductor substrate,
• said first trench has a plurality of first portions and a- plurality of second portions,
• said plurality of first portions are arranged along a second direction orthogonal to said first direction and said third direction,
• each of said plurality of first portions has one end portion located on said boundary between said cell region and said terminal region and extends towards said one end portion along said first direction, and
• each of said plurality of second portions is located between adjacent first portions out of said plurality of first portions and extends along said second direction to connect said adjacent first portions to each other,
• said insulated gate semiconductor device further comprising:
• a plurality of second main electrode regions of said first conductivity type, each of which is formed from a region in said cell region of said first main surface, which is surrounded by said adjacent first portions and adjacent second portions out of said plurality of second portions corresponding to said adjacent first portions towards an inside of said base layer along upper portions of side surfaces of said adjacent first portions and upper portions of side surfaces of said adjacent second portions;
• a first gate control electrode so formed inside said first trench as to be located beneath an upper surface of said first trench, said first gate control electrode filling said first trench with said first gate insulating film interposed therebetween;
• a second trench formed from a region in said first main surface which is defined by said one end which is said boundary and the other end away from said boundary towards said terminal region by a second distance shorter than said first distance along said first direction, up to a third bottom surface located inside said well layer along said third direction, said second trench having a third depth from said first main surface to said third bottom surface and extending along said second direction while being connected to said one end portion which each of said plurality of first portions has;
• a second gate insulating film formed entirely on said third bottom surface and side surfaces of said second trench;
• a second gate control electrode so formed inside said second trench as to be located beneath an upper surface of said second trench, said second gate control electrode filling said second trench with said second gate insulating film interposed therebetween and being electrically connected to said first gate control electrode at said one end portion which each of said plurality of first portions has;
• an insulating layer formed on an upper surface of said base layer, an upper surface of said first gate control electrode, an upper surface of said first gate insulating film, an upper surface of said second gate control electrode, an upper surface of said second gate insulating film, an upper surface of said well layer and a region in said terminal region of said first main surface which is located outside an end of said well layer;
• a plurality of first contact portions each so formed in said insulating layer as to expose part of an upper surface which each of said plurality of second main electrode regions has and an upper surface of a portion in said base layer which is surrounded by each of said plurality of second main electrode regions;
• a plurality of second contact portions each so formed in said insulating layer as to expose part of an upper surface of a portion in said base layer which is surrounded by a side surface of said second trench on the side of said boundary, side surfaces of said adjacent first portions and a side surface of an outermost second portion of said plurality of second portions which faces said second trench;
• a first electrode layer for second main electrode formed in said plurality of first contact portions and said plurality of second contact portions and on a portion in said insulating layer which is located on said cell region of said first main surface, having one end portion away from said boundary by a seventh distance longer than said eighth distance along said first direction, extending along said second direction and being electrically connected to each of said plurality of second main electrode regions and said base layer;
• a third contact portion so formed in said insulating layer as to expose part of said upper surface of said second gate control electrode;
• a gate electrode formed inside said third contact portion, on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said cell region along said first direction by a third distance shorter than said eighth distance and on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said terminal region along said first direction by a fourth distance shorter than said first distance, said gate electrode extending along said second direction and being electrically connected to said second gate control electrode through said third contact portion;
• a fourth contact portion so formed in said insulating layer as to expose part of an upper surface of a portion in said well layer which is sandwiched between a location away from said boundary towards said terminal region along said first direction by a fifth distance which is shorter than said first distance and longer than said fourth distance and said other end of said well layer away from said boundary by said first distance;
• and
• a second electrode layer for second main electrode formed in said fourth contact portion and on a portion in said insulating layer which is defined by said location away from said boundary towards said terminal region along said first direction by said fifth distance and a location away from said boundary towards said terminal region along said first direction by a sixth distance longer than said first distance, extending along said second direction and being electrically connected to said well layer through said fourth contact portion,
• wherein both the length of said first electrode layer for second main electrode and that of said second electrode layer for second main electrode along said second direction are longer than the length of said gate electrode along said second direction,
• said insulated gate semiconductor device further comprising:
• a connection layer having a side surface which is away from one end portion of said gate electrode in said second direction by a predetermined distance along said second direction and extends along said first direction, being formed on a portion of said insulating layer which is defined by said one end portion of said first electrode layer for second main electrode and said location away from said boundary towards said terminal region by said fifth distance along said first direction, and configured to electrically connect said first electrode layer for second main electrode and said second electrode layer for second main electrode to each other,
• wherein said third depth is larger than said first depth, and
• said fourth depth is larger than said third depth.

An insulated gate semiconductor device which comprises an MOS transistor structure, comprising:

• a semiconductor substrate of a first conductivity type having a first main surface and a second main surface which are opposed to each other in a third direction;
• a base layer of a second conductivity type formed from a cell region in said first main surface towards a first bottom surface located inside said semiconductor substrate along said third direction, having one end portion located on a boundary between said cell region and a terminal region adjacent to said cell region and a first depth from said first main surface to said first bottom surface;
• a first trench formed from said cell region in said first main surface, through said base layer, up to a second bottom surface located inside said semiconductor substrate along said third direction, and having a second depth from said first main surface to said second bottom surface;
• a first gate insulating film formed entirely on said second bottom surface and side surfaces of said first trench;
• and
• a first main electrode formed on said second main surface,
• wherein said first direction is parallel to said first main surface and orthogonal to said third direction,
• said first depth is smaller than said second depth,
• said first trench has a plurality of first portions and a plurality of second portions,
• said plurality of first portions are arranged along a second direction orthogonal to said first direction and said third direction,
• each of said plurality of first portions has one end portion located on said boundary between said cell region and said terminal region and extends towards said one end portion along said first direction, and
• each of said plurality of second portions is located between adjacent first portions out of said plurality of first portions and extends along said second direction to connect said adjacent first portions to each other,
• said insulated gate semiconductor device further comprising:
• a plurality of second main electrode regions of said first conductivity type, each of which is formed from a region in said cell region of said first main surface, which is surrounded by said adjacent first portions and adjacent second portions out of said plurality of second portions corresponding to said adjacent first portions, towards an inside of said base layer along upper portions of side surfaces of said adjacent first portions and upper portions of side surfaces of said adjacent second portions;
• a first gate control electrode so formed inside said first trench as to be located beneath an upper surface of said first trench, said first gate control electrode filling said first trench with said first gate insulating film interposed therebetween;
• a second trench formed from a region in said first main surface which is defined by said one end which is said boundary and the other end away from said boundary toward said terminal region by a first distance along said first direction, up to a third bottom surface located inside said semiconductor substrate along said third direction, said second trench having a third depth from said first main surface to said third bottom surface and extending along said second direction while being connected to said one end portion which each of said plurality of first portions has;
• a second gate insulating film formed entirely on said third bottom surface and side surfaces of said second trench;
• a second gate control electrode so formed inside said second trench as to be located beneath an upper surface of said second trench, said second gate control electrode filling said second trench with said second gate insulating film interposed therebetween and being electrically connected to said first gate control electrode at said one end portion which each of said plurality of first portions has;
• an insulating layer formed on an upper surface of said base layer, an upper surface of said first gate control electrode, an upper surface of said first gate insulating film, an upper surface of said second gate control electrode, an upper surface of said second gate insulating film and a portion of said first main surface which is located outside one of said side surfaces of said second trench on the side of said terminal region;
• a plurality of first contact portions each so formed in said insulating layer as to expose part of an upper surface which each of said plurality of second main electrode regions has and an upper surface of a portion in said base layer which is surrounded by each of said plurality of second main electrode regions;
• a plurality of second contact portions each so formed in said insulating layer as to expose part of an upper surface of a portion in said base layer which is surrounded by a side surface of said second trench on the side of said boundary, side surfaces of said adjacent first portions and a side surface of an outermost second portion of said plurality of second portions which faces said second trench;
• a second main electrode formed in said plurality of first contact portions and said plurality of second contact portions and on a portion in said insulating layer which is located on said cell region of said first main surface, having one end portion away from said boundary by a fourth distance along said first direction, extending along said second direction and being electrically connected to each of said plurality of second main electrode regions and said base layer;
• a third contact portion so formed in said insulating layer as to expose part of said upper surface of said second gate control electrode;
• and
• a gate electrode formed inside said third contact portion, on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said cell region along said first direction by a third distance shorter than said fourth distance and on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said terminal region along said first direction by a second distance longer than said first distance, said gate electrode extending along said second direction and being electrically connected to said second gate control electrode through said third contact portion,
• wherein said third depth is larger than said first depth, and
• no semiconductor layer of said second conductivity type is formed in a portion of said semiconductor substrate which is located immediately below said gate electrode, which is defied by a side surface of said second trench on the side of said terminal region and said location away from said boundary towards said terminal region by said second distance along said first direction.

An insulated gate semiconductor device which comprises an MOS transistor structure, comprising:

• a semiconductor substrate of a first conductivity type having a first main surface and a second main surface which are opposed to each other in a third direction;
• a base layer of a second conductivity type formed from a cell region in said first main surface and a region in said first main surface which is defined by one end which is a boundary between said cell region and a terminal region adjacent to said cell region and the other end away from said boundary towards said terminal region by a first distance along a first direction, towards an inside of said semiconductor substrate along said third direction;
• a trench formed from said cell region in said first main surface, through said base layer, up to said inside of said semiconductor substrate along said third direction;
• a gate insulating film formed entirely on a bottom surface and side surfaces of said trench;
• and
• a first main electrode formed on said second main surface,
• wherein said first direction is parallel to said first main surface and orthogonal to said third direction,
• a first depth from said first main surface to a bottom surface of said base layer is smaller than a second depth from said first main surface to said bottom surface of said trench,
• said trench has a plurality of first portions and a plurality of second portions,
• said plurality of first portions are arranged along a second direction orthogonal to said first direction and said third direction,
• each of said plurality of first portions has one end portion located on said boundary between said cell region and said terminal region and extends towards said one end portion along said first direction, and
• each of said plurality of second portions is located between adjacent first portions out of said plurality of first portions and extends along said second direction to connect said adjacent first portions to each other,
• said insulated gate semiconductor device further comprising:
• a plurality of second main electrode regions of said first conductivity type, each of which is formed from a region in said cell region of said first main surface which is surrounded by said adjacent first portions and adjacent second portions out of said plurality of second portions corresponding to said adjacent first portions towards an inside of said base layer along upper portions of side surfaces of said adjacent first portions and upper portions of side surfaces of said adjacent second portions;
• a gate control electrode so formed inside said trench as to be located beneath an upper surface of said trench, said gate control electrode filling said trench with said gate insulating film interposed therebetween;
• an insulating layer formed on an upper surface of said base layer, an upper surface of said gate control electrode, an upper surface of said gate insulating film and a region in said terminal region of said first main surface which is located outside an end of said base layer;
• a plurality of first contact portions each so formed in said insulating layer as to expose part of an upper surface which each of said plurality of second main electrode regions has and an upper surface of a portion in said base layer which is surrounded by each of said plurality of second main electrode regions;
• a plurality of second contact portions each so formed in said insulating layer as to expose part of an upper surface of a portion in said base layer which is defined by said boundary, side surfaces of said adjacent first portions and a side surface of an outermost second portion of said plurality of second portions which faces said boundary;
• a second main electrode formed in said plurality of first contact portions and said plurality of second contact portions and on a portion in said insulating layer which is located on said cell region of said first main surface, said second main electrode extending along said second direction and being electrically connected to each of said plurality of second main electrode regions and said base layer;
• a plurality of third contact portions provided for said plurality of first portions, respectively, each of which is so formed in said insulating layer as to expose a portion which is sandwiched between a first location away from said boundary along said first direction by a fourth distance and a second location away from said boundary along said first direction by a fifth distance longer than said fourth distance in an upper surface of a portion of said gate control electrode filling each of said plurality of first portions;
• and
• a gate electrode formed inside each of said plurality of third contact portions, on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said cell region along said first direction by a third distance longer than said fifth distance and on a portion in said insulating layer which is defined by said boundary and a location away from said boundary towards said terminal region along said first direction by a second distance longer than said first distance, said gate electrode extending along said second direction and being electrically connected to said gate control electrode through said plurality of third contact portions.

A method of manufacturing a gate interconnection structure, comprising the steps of:

• (a) forming a base layer of a second conductivity type from a main surface of a semiconductor substrate of a first conductivity type up to an inside of said semiconductor substrate along a third direction;
• (b) forming a first trench penetrating said base layer, extending along a first direction which is in parallel with said main surface and orthogonal to said third direction and having a bottom surface inside said semiconductor substrate and a second trench penetrating said base layer, extending along a second direction orthogonal to said first direction and said third direction while being connected to one end portion of said first trench in said first direction and having a bottom surface inside said semiconductor substrate;
• (c) forming a first gate oxide film on said bottom surface and side surfaces of said first trench and a second gate oxide film on said bottom surface and side surfaces of said second trench;
• (d) forming a first gate control electrode which fills said first trench with said first gate oxide film interposed therebetween and a second gate control electrode which fills said second trench with said second gate oxide film interposed therebetween;
• (e) forming an insulating layer, which covers an upper surface of said first gate control electrode and an upper surface of said second gate control electrode, on said main surface of said semiconductor substrate;
• (f) forming a gate contact portion in said insulating layer, said gate contact portion exposing said upper surface of said second gate control electrode;
• and
• (g) forming a gate electrode on an upper surface of said insulating layer, said gate electrode filling said gate contact portion and having one end portion protruding outside beyond an end portion of said base layer in said first direction.

A method of manufacturing a gate interconnection structure, comprising the steps of:

• (a) forming a base layer of a second conductivity type from a main surface of a semiconductor substrate of a first conductivity type up to an inside of said semiconductor substrate along a third direction;
• (b) forming a first trench penetrating said base layer, extending along a first direction which is in parallel with said main surface and orthogonal to said third direction and having a bottom surface inside said semiconductor substrate and a second trench penetrating said base layer, extending along a second direction orthogonal to said first direction and said third direction while being connected to one end portion of said first trench in said first direction and having a bottom surface inside said semiconductor substrate;
• (c) forming a first gate oxide film on said bottom surface and side surfaces of said first trench and a second gate oxide film on said bottom surface and side surfaces of said second trench;
• (d) forming a first gate control electrode which fills said first trench with said first gate oxide film interposed therebetween and a second gate control electrode which fills said second trench with said second gate oxide film interposed therebetween;
• (e) forming an insulating layer, which covers an upper surface of said first gate control electrode and an upper surface of said second gate control electrode, on said main surface of said semiconductor substrate;
• (f) forming a gate contact portion and a source contact portion in said insulating layer, said gate contact portion exposing said upper surface of said second gate control electrode, said source contact portion exposing an upper surface of said base layer located outside said second trench;
• and
• (g) forming a gate electrode and a source electrode on an upper surface of said insulating layer, said gate electrode filling said gate contact portion, said source electrode filling said source contact portion and having one end portion protruding outside beyond an end portion of said base layer in said first direction.