Focused ion beam apparatus
AssigneeSeiko Instruments Inc.
InventorKazuo Aita
Life of this patent
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Abstract
The present invention achieves the quick and precise neutralization operation for wide area charge up and limited area charge up, both existing in a sample in a mixed manner at the same time, by having charge neutralizers separately provided for wide area charge up and limited area charge up respectively, or by having a charge neutralizer with a scanning function, so that a beam can be scanned or stopped at the perceived area by a deflector, or having a charge neutralizer with an iris having a central opening and openings in the periphery of the central opening within the optical system, so that a quick and precise neutralization operation can be achieved with respect to wide area charge up and limited area charge up both existing in a sample in a mixed manner at the same time.
Claims14
A focused ion beam apparatus comprising:
- means for irradiating a sample with an ion beam;
- and electron irradiation means for neutralizing an electrical charge of the sample caused by the ion beam irradiation, the electron irradiation means having first means for irradiating electrons over a wide area of the sample and second means for irradiating electrons in a local area of the sample.
A focused ion beam apparatus comprising:
- means for irradiating a sample with an ion beam;
- and at least one neutralizer for neutralizing electrical charge of the sample caused by ion irradiation, the at least one neutralizer having means for irradiating electrons over a wide area of the sample and means for irradiating electrons onto a local area of the sample at the same time as irradiation of electrons over a wide area of the sample.
A focused ion beam apparatus comprising:
- an ion beam source for irradiating a local area of a sample surface with a focused ion beam;
- a first electron source for irradiating electrons onto the local area of the sample surface to neutralize charge-up of the local area;
- and a second electron source for irradiating electrons over a wide area of the sample surface including the local area to maintain a constant potential across the sample surface.
Dependencies are inferred from the claim text.