Parallel, individually addressable probes for nanolithography
AssigneeThe Board of Trustees of the University of Illinois
InventorsChang Liu, Ming Zhang, David Andrew Bullen
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Abstract
A microfabricated probe array for nanolithography and process for designing and fabricating the probe array. The probe array consists of individual probes that can be moved independently using thermal bimetallic actuation or electrostatic actuation methods. The probe array can be used to produce traces of diffusively transferred chemicals on the substrate with sub-1 micrometer resolution, and can function as an arrayed scanning probe microscope for subsequent reading and variation of transferred patterns.
Claims31
An apparatus for applying a pattern to a substrate for nanolithography, the apparatus comprising:
- at least one patterning compound;
- an array of actuated probes, said array of actuated probes being arranged in parallel, wherein each of said actuated probes comprises:
- a cantilever;
- a tip at an end of said cantilever for applying one of said at least one patterning compound to said substrate;
- and
- an actuator operatively coupled to said cantilever, said actuator being responsive to an applied current or voltage to move said cantilever so as to move said tip relative to said substrate.
The apparatus for applying at least one patterning compound to a subtrate for nanolithography, the apparatus comprising:
- an array of actuated probes, said array of actuated probes being arranged in parallel, wherein each of said actuated probes comprises:
- a cantilever;
- a tip at an end of said cantilever for applying one of said at least one patterning compound to said substrate;
- and
- an actuator operatively coupled to said cantilever, said actuator being responsive to an applied current or voltage to move said cantilever so as to move said tip relative to said substrate;
- wherein said actuator is a thermal actuator;
- and
- wherein said thermal actuator further comprises:
- a resistive heater connected to said cantilever, said resistive heater being selectively operable in response to said current;
- and
- a wire electrically connecting said resistive heater to a current source,
- whereby application of current or voltage from said current or voltage source to said resistive heater results in a deflection of said cantilever.
An apparatus for applying at least one patterning compound to substrate for nanolithography, the appartus comprising;
- an array of actuated probes, said array of actuated probes being arranged in parallel, wherein each of said actuated probes comprises:
- a cantilever;
- a tip at an end of said cantilever for applying one of said at least one patterning compound to said substrate;
- and
- an actuator operatively coupled to said cantilever, said actuator being responsive to an applied current or voltage to move said cantilever so as to move said tip relative to said substrate;
- wherein said actuator is an electronic actuator;
- said electrostatic actuator further comprising:
- a first electrode formed at a second end of said cantilever opposite to said tip;
- a second electrode in electrostatic communication with said first electrode;
- at least one of said first electrode and said second electrode being coupled to said current or voltage source;
- whereby selective distribution of said voltage from said current or voltage source causes a differential electrical voltage across said first electrode and said second electrode, causing at least a portion of said cantilever to tilt.
A method of applying at least one patterning compound to a substrate with arbitrary patterns for nanolithography, the method comprising the steps of:
- providing a plurality of selectively actuated probes, each probe having a tip on a distal end;
- providing said tips with said at least one patterning compound;
- moving said tips of said plurality of selectively actuated probes over the substrate so that said tips are near or in contact with said substrate to allow application of said at least one patterning compound;
- raster-scanning said array over said substrate;
- and,
- during said raster-scanning step, selectively actuating at least one selected probe from said array of selectively actuated probes so as to move said tip of said selected probe away from said substrate,
- whereby said at least one selected probe does not apply said at least one patterning compound to said substrate, and whereby non-selected probes apply said at least one patterning compound to said substrate.
A probe configured for selective actuation, the probe comprising:
- a cantilever;
- a tip at an end of said cantilever configured for applying at least one patterning compound;
- a resistive heater of conductive metal connected to said cantilever, said resistive heater being selectively operable in response to a current;
- a conductive path electrically connecting said resistive heater to a current source;
- whereby application of current to said resistive heater results in a deflection of said cantilever.
A method of forming a selectively actuated probe comprising:
- formin a silicon nitride cantilever on a substrate, the cantilever having a tip;
- forming a metal resistive heater on the formed cantilever;
- releasing the cantilever from the substrate.
The method of applying at least one patterning compound to a substrate with arbitrary patterns for nanolithography, the method comprising the steps of:
- selectively placing one or more of a plurality of probes in a position that is one of in contact with the substrate and out of contact with the substrate;
- wherein the plurality of probes are configured to apply the at least one patterning compound to the substrate when in contact with the substrate.
Dependencies are inferred from the claim text.