Micro devices manufacturing method utilizing concave and convex alignment mark patterns
AssigneeNikon Corporation
InventorsShinji Mizutani, Kazuya Ota, Masahiko Yasuda
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Abstract
An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.
Claims11
An exposure method for transferring an image of a pattern on a mask to a substrate, said method comprising the steps of:
- transferring an image of a mark on a mask to a substrate to form an alignment mark on a substrate, wherein said alignment mark being structured by arranging a plurality of sub-patterns formed by a plurality of concave and convex patterns extending in a first direction, in a second direction which is perpendicular to said first direction, with a predetermined interval;
- and
- detecting said alignment mark formed on said substrate to obtain positional information of said substrate based on the obtained information.
An exposure apparatus which transfers an image of a pattern on a mask to a substrate comprising:
- an optical system which transfers an image of a pattern on said mask to said substrate so as to form an alignment mark on said substrate, wherein said alignment mark being structured by arranging a plurality of sub-patterns formed by a plurality of concave and convex patters extending in a first direction, in a second direction which is perpendicular to the first direction, with a predetermined interval;
- and
- a detection system which detects said alignment mark formed on said substrate to obtain positional information on the substrate base on a detected result.
Dependencies are inferred from the claim text.