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US 6,641,710 B2Granted
Metal plating method
AssigneeSoqi Kabushiki Kaisha
InventorsYasuo Sakura, Itoyo Tsuchiya, Keiko Mano
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AssigneeSoqi Kabushiki Kaisha
InventorsYasuo Sakura, Itoyo Tsuchiya, Keiko Mano
Estimating the term…
To provide a method of metal plating to give a metal plating coating with excellent luster and high corrosion resistance and wear resistance. This metal plating method includes pulse plating by pulsed electrolysis by periodically applying electric current. The pulsed electrolysis is carried out in condition that the pulse frequency and the current density are controlled so that the ratio of the quantity of deposited lattice per pulse to the height of the lattice is 0.28 or lower, that the duty ratio of the pulse frequency is controlled to be 0.5 or lower, and that the duration of complete pause caused by distortion of pulse waveform is controlled to be one half or longer of the duration of current interruption. The foregoing plating is carried out while fluidizing plating solution to be brought into contact with the object body 5 at a flow rate of 0.04 (m/s) or higher and making the solution evenly flow along the face to be plated.
A chromium plating method for carrying out pulse plating by pulsed electrolysis by periodically applying electricity, wherein said pulsed electrolysis is carried out in condition that the pulse frequency and the current density are controlled so that the ratio of the quantity of deposited lattice per pulse to the height of the lattice is about 0.28 or lower, that the duty ratio of said pulse frequency is controlled to be about 0.5 or lower, and that the duration of complete pause caused by distortion of pulse waveforms is controlled to be one half or longer of the duration of current interruption.
A chromium plating method for carrying out pulse plating by pulsed electrolysis by periodically applying electricity,
Dependencies are inferred from the claim text.