Magnetic multi-layer film manufacturing apparatus

A method of forming a magnetic multi-layer film, the method comprising:

• positioning a substrate into a first film deposition chamber from a carrying chamber in operational communication therewith;
• depositing a first magnetic film group, the first magnetic film group comprising a first plurality of magnetic layers, each magnetic layer deposited successively on the substrate continuously in a laminated state to form a magnetic multi-layer film while the substrate is in the first film deposition chamber;
• positioning the magnetic multi-layer film into at least a second film deposition chamber;
• and
• depositing a second magnetic film group, the second magnetic film group comprising a second plurality of magnetic layers, each magnetic layer deposited successively on the magnetic multi-layer film continuously in a laminated state to form a stacked magnetic multi-layer film while the substrate is in the second film deposition chamber;
• wherein within any one of the magnetic film groups, an antiferromagnetic layer is deposited adjacent a magnetic layer continuously within any one of the film deposition chambers.

A method of forming a magnetic multi-layer film, the method comprising:

• positioning a substrate into a first film deposition chamber from a carrying chamber in operational communication therewith;
• depositing a first magnetic film group, the first magnetic film group comprising a first plurality of magnetic layers, each magnetic layer deposited successively on the substrate continuously in a laminated state to form a magnetic multi-layer film while the substrate is in the first film deposition chamber;
• positioning the magnetic multi-layer film into at least a second film deposition chamber;
• and
• depositing a second magnetic film group. the second magnetic film group comprising a second plurality of magnetic layers, each magnetic layer deposited successively on the magnetic multi-layer film continuously in a laminated state to form a stacked magnetic multi-layer film while the substrate is in the second film deposition chamber;
• positioning the magnetic multi-layer film or stacked magnetic multi-layer film in an oxidizing chamber from the carrying chamber in operational communication therewith;
• and
• oxidizing a metal layer.

A method of forming a magnetic multi-layer film, the method comprising:

• positioning a substrate into a first film deposition chamber from a carrying chamber in operational communication therewith;
• depositing a first magnetic film group, the first magnetic film group comprising a first plurality of magnetic layers, each magnetic layer deposited successively on the substrate continuously in a laminated state to form a magnetic multi-layer film while the substrate is in the first film deposition chamber;
• positioning the magnetic multi-layer film into at least a second film deposition chamber;
• and
• depositing a second magnetic film group, the second magnetic film group comprising a second plurality of magnetic layers, each magnetic layer deposited successively on the magnetic multi-layer film continuously in a laminated state to form a stacked magnetic multi-layer film while the substrate is in the second film deposition chamber;
• wherein the stacked magnetic multi-layer film structure has a MR ratio of at least 7%.

A method of forming a magnetic multi-layer film, the method comprising:

• introducing a substrate into a carrying chamber having a plurality of deposition chambers in operational communication therewith and a manipulating device;
• operating the manipulating device to place the substrate in a cleaning chamber;
• cleaning the substrate by an etching or a sputtering technique;
• operating the manipulating device to successively place the substrate in each of the plurality of deposition chambers in a predetermined sequence;
• and
• depositing a plurality of magnetic film groups to form a magnetic multi-layer film, the plurality of magnetic film groups comprising a plurality of magnetic film layers, each one of the plurality of magnetic film groups continuously deposited in a laminated state in a respective one of the plurality of deposition chambers;
• wherein the last of the plurality of magnetic film layers of one of the plurality of magnetic film groups comprises a metal oxide layer, and a first of the plurality of magnetic film layers of another of the plurality of magnetic film groups comprises a magnetic layer, the metal oxide layer and the magnetic layer deposited adjacent each other in different deposition chambers.

A method of forming a magnetic multi-layer film, the method comprising:

• introducing a substrate into a carrying chamber having a plurality of deposition chambers in operational communication therewith and a manipulating device;
• operating the manipulating device to place the substrate in a cleaning chamber;
• cleaning the substrate by an etching or a sputtering technique;
• operating the manipulating device to successively place the substrate in each of the plurality of deposition chambers in a predetermined sequence;
• depositing a plurality of magnetic film groups to form a magnetic multi-layer film, the plurality of magnetic film groups comprising a plurality of magnetic film layers, each one of the plurality of magnetic film groups continuously deposited in a laminated state in a respective one of the plurality of deposition chambers;
• and
• oxidizing a metal layer between successive divisions.

A method of forming a magnetic multi-layer film, the method comprising:

• introducing a substrate into a carrying chamber having a plurality of deposition chambers in operational communication therewith and a manipulating device;
• operating the manipulating device to place the substrate in a cleaning chamber;
• cleaning the substrate by an etching or a sputtering technique;
• operating the manipulating device to successively place the substrate in each of the plurality of deposition chambers in a predetermined sequence;
• depositing a plurality of magnetic film groups to form a magnetic multi-layer film, the plurality of magnetic film groups comprising a plurality of magnetic film layers, each one of the plurality of magnetic film groups continuously deposited in a laminated state in a respective one of the plurality of deposition chambers;
• and
• depositing at least one non-magnetic film in at least one of the plurality of groups.

A method of forming a magnetic multi-layer film, the method comprising:

• introducing a substrate into a carrying chamber having a plurality of deposition chambers in operational communication therewith and a manipulating device;
• operating the manipulating device to place the substrate in a cleaning chamber;
• cleaning the substrate by an etching or a sputtering technique;
• operating the manipulating device to successively place the substrate in each of the plurality of deposition chambers in a predetermined sequence;
• depositing a plurality of magnetic film groups to form a magnetic multi-layer film, the plurality of magnetic film groups comprising a plurality of magnetic film layers, each one of the plurality of magnetic film groups continuously deposited in a laminated state in a respective one of the plurality of deposition chambers;
• and
• wherein the magnetic multi-layer film structure has a MR ratio of at least 7%.

A magnetic multi-layer film manufacturing apparatus, comprising:

• a transferring chamber;
• a plurality of film-depositing chambers in operative communication with the transferring chamber, each film-depositing chamber comprising a rotatable substrate holder, a plurality of targets, and a double layer rotating shutter mechanism disposed between the rotatable substrate holder and the plurality of targets, each film-depositing chamber controllable to deposit at least one layer of a magnetic multi-layer film structure;
• and
• a robotic transferring device disposed in the transferring chamber, the robotic transferring device rotatable about a central location and freely stretchable.

A deposition apparatus, comprising:

• a chamber comprising a housing for a target on a first surface;
• and
• a shutter mechanism, the shutter mechanism comprising a first platen having at least two openings therein and a second platen having an opening therein,
• wherein the first platen and second platen are arranged substantially coaxial and are each freely and independently rotatable about an axis within the chamber such that the opening in the first platen and the opening in the second platen are substantially longitudinally aligned with respect to a center axis of the housing for a target.

A method of depositing material from a plurality of targets in a chamber, the method comprising:

• rotating a first platen having one opening to align the one opening with a first of a plurality of targets;
• rotating a second platen having at least two openings therein so that none of the openings are aligned with the first of the plurality of targets;
• sputtering the first of the plurality of targets for a predetermined time;
• rotating the second platen to align one of the at least two openings with the first target;
• and
• depositing material from the first of the plurality of targets onto a substrate.

A method of depositing material onto a substrate from a plurality of targets in a chamber that includes two rotatable platens arranged between the substrate and the plurality of targets, wherein a first of the two platens includes one opening therein and a second of the two platens includes at least two openings therein, the method comprising:

• rotating the second of the two platens so that none of the openings are aligned with a first of the plurality of targets;
• presputtering the first of the plurality of targets for a predetermined time with the second of the two platens arranged such that none of the openings are aligned with the first target;
• rotating the second of the two platens to align one of the at least two openings with the first target;
• and
• sputtering the first target while the one of the at least two openings of the second of the two platens is aligned with the first target and while the first of the two platens is aligned such that the one opening of the first of the two platens is also aligned with the first target so as to deposit material from the first of the plurality of targets onto the substrate.