Substrate processing using a member comprising an oxide of a group IIIB metal
AssigneeApplied Materials, Inc.
InventorsNianci Han, Hong Shih, Jie Yuan, Danny Lu, Diana Ma
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Abstract
An erosion resistant member that may be used in the processing of a substrate in a plasma of a processing gas, comprises at least a portion that may be exposed to the plasma of the processing gas and that contains more than about 3% by weight of an oxide of a Group IIIB metal. The portion may also further contain a ceramic compound selected from silicon carbide, silicon nitride, boron carbide, boron nitride, aluminum nitride, aluminum oxide, and mixtures thereof.
Claims19
An erosion resistant member that is used in the processing of a substrate in a plasma of a processing gas, the member comprising at least a portion that is exposed to the plasma of the processing gas, said portion comprising more than about 3% by weight of an oxide of a Group IIIB metal.
An erosion resistant member that is used in the processing of a substrate in a plasma of an etchant gas, the member comprising at least a portion that is exposed to the plasma of the etchant gas, said portion comprising (i) more than about 3% by weight of yttrium oxide and (ii) aluminum oxide.
Dependencies are inferred from the claim text.